한양대 나노 공정 및 소자 연구실 로고

Journals-

HOME > Publication > Journals


Num Title Editor Journal Publish date
161 Uniform dehydrogenation of amorphous silicon thin films using a wide thermal annealing system Yong Chan Jung, Sejong Seong, Taehoon Lee, Jinho Ahn, Tae Hyun Kim, Won-Jae Yeo and In-Sung Park Semiconductor Science and Technology 2017.01
160 Fabrication of Fe3O4-ZnO core-shell nanoparticles by rotational atomic layer deposition and their multi-functional properties Sejong Seong, Yong Chan Jung, Taehoon Lee, In-Sung Park, and Jinho Ahn Current Applied Physics 2016.09
159 Impact of pellicle transmittance on imaging performance analyzed by coherent scattering microscopy Dong Gon Woo, Seongchul Hong, Han Ku Cho, and Jinho Ahn Nanoscience and Nanotechnology Letters 2016.07.01
158 GeOx interfacial layer scavenging remotely induced by metal electrode in metal/HfO2/GeOx/Ge capacitors Taehoon Lee, Yong Chan Jung, Sejong Seong, Sung Bo Lee, In-Sung Park, and Jinho Ahn Applied Physics Letters 2016.07
157 Coherent scattering microscopy as an effective inspection tool for analyzing performance of phase shift mask Dong Gon Woo, Jae Uk Lee, Seong Chul Hong, Jinho Ahn Optics Express 2016. 05.25
156 Effect of EUV photoresist underlayer optical properties on imaging performance Jung Sik Kim, Seongchul Hong, Han Ku Cho, and Jinho Ahn Journal of Vacuum Science and Technology B 2015.11.23
155 Resistive Switching Characteristics of Atomic-Layer-Deposited Y2O3 Insulators with Deposition Temperature Yong Chan Jung, Sejong Seong, Taehoon Lee, In-Sung Park, and Jinho Ahn Journal of Nanoscience and Nanotechnology 2015.10
154 Lattice Distortion in In3SbTe2 Phase Change Material with Substitutional Bi Minho Choi, Heechae Choi, Seungchul Kim, Jinho Ahn & Yong Tae Kim Scientific Reports 2015.08.11
153 Evaluation of metal absorber materials for beyond-extreme-ultraviolet lithography Seongchul Hong, Jung Sik Kim, Jae Uk Lee, Seung Min Lee, Junghwan Kim, Jinho Ahn Journal of Nanoscience and Nanotechnology 2015.05
152 The variation of the enhanced PL efficiency of Y2O3:Eu3+ phosphor films with the height to the ZrO2 nanoparticle-assisted 2D PCL by reverse nano-imprint lithography Chulkyun Park, Hyojun Kim, In-Sung Park, Ki-Young Ko, Ki-Kang Kim, Byoung Hun Lee, Jinho Ahn Microelectronic Engineering 2015.03.25
151 Dimensionally controlled complex 3D sub-micron pattern fabrication by single step dual diffuser lithography (DDL) Hassan Hafeez, Heon-Yul Ryu, Il Sin An, Hye-Keun Oh, Jin-Ho Ahn, Jin-Goo Park Microelectronic Engineering 2015.03.10
150 Metal-HfO2-Ge capacitor: Its enhanced charge trapping properties with S-treated substrate and atomic-layer-deposited HfO2 layer In-Sung Park, Yong Chan Jung, Sejong Seong, Jinho Ahn, and Sung Bo Lee Journal of Vacuum Science & Technology A 2014.12.23
149 Anode dependence of set voltage in resistive switching of metal/HfO2/metal In-Sung Park, Yong Chan Jung, and Jinho Ahn APPLIED PHYSICS LETTERS 2014.12.04
148 Nanopatterned yttrium aluminumgarnet phosphor incorporated filmfor high-brightness GaN-based white light emitting diodes high-brightness GaN-based white light emitting diodes Joong-yeon Cho, Sang-Jun Park, Jinho Ahn, Heon Lee Thin Solid Films 2014.11.03
147 Atomic layer deposition of Y2O3 films using heteroleptic liquid (iPrCp)2Y(iPr-amd) precursor In-Sung Park, Yong Chan Jung, Sejong Seong, Jinho Ahn, Jiehun Kang, Wontae Noh and Clement Lansalot-Matras Journal of Materials Chemistry C 2014.09.11
146 Attenuated phase-shift mask for mitigation of photon shot noise effect in contact hole pattern for extreme ultraviolet lithography Jung Sik Kim, Seongchul Hong, Jae Uk Lee, Seung Min Lee, and Jinho Ahn Applied Physics Express 2014.08.27
145 Substrate effects on the transmittance of 1D Kilbock Lee and Jinho Ahn Optics Express 2014.08.11
144 Various nanofabrication approaches towards twodimensional photonic crystals for ceramic plate phosphor-capped white light-emitting diodes Seong Woong Yoon,Hoo Keun Park, Ki-Young Ko, Jinho Ahn and Young Rag Do Journal of Materials Chemistry C 2014.07.16
143 Dependence of Interface Charge Trapping on Channel Engineering in Pentacene Field Effect Transistors Sunwoo Lee, Junghyuck Park, In-Sung Park, and Jinho Ahn Journal of Nanoscience and Nanotechnology 2014.07
142 Dielectric function of Si1-xGex films grown on silicon-on-insulator substrates In-Sung Park, Yong Chan Jung, Jinho Ahn, Tae-Hun Shim, Du-Yeong Lee, and Jea-Gun Park Journal of Applied Physics 2014.06.17
141 Actinic critical dimension measurement of contaminated extreme ultraviolet mask using coherent scattering microscopy Jae Uk Lee, Seongchul Hong, Jonggul Doh, SeeJun Jeong and Jinho Ahn Journal of Vacuum Science and Technology B 2014.04.28
140 Highly sensitive wide bandwidth photodetectors using chemical vapor deposited graphene Chang Goo Kang, Sang Kyung Lee, Tae Jin Yoo, Woojin Park, Ukjin Jung, Jinho Ahn and Byoung Hun Lee Applied Physics Express 2014.04.21
139 FDTD simulation of transmittance characteristics of one-dimensional conducting electrodes Killbock Lee, Seok Ho Song and Jinho Ahn Optics Express 2014.03.24
138 Fabrication of Al2O3 Coated 2D TiO2 Nanoparticle Photonic Crystal Layers by Reverse Nano-Imprint Lithography andPlasma Enhanced Atomic Layer Deposition Ki-Kang Kim, Ki-Young Ko, and Jinho Ahn Journal of Nanoscience and Nanotechnology 2013.10.26
137 Fabrication of SiC Nanoparticles by Physical Milling for Ink-Jet Printing jong-Woong Kim, Jae-Shik Shim, Changjun Maeng, Young-Sung Kim, Jinho Ahn, Min-Gi Kwak, Sung-Jei Hong and Hyun-Min Cho Journal of Nanoscience and Nanotechnology 2013.08.13
136 Stochastic Patterning Simulation Using Attenuated Phase-Shift Mask for Extreme Ultraviolet Lithography Seongchul Hong, Seejun Jeong, Jae Uk Lee, Seung Min Lee, Jinho Ahn Applied Physics Express 2013.08.12
135 Very thin EUV mask absorber materials for extremely fine pitch patterning Jae Uk Lee, Seongchul Hong, Jinho Ahn Japan Society of Applied Physics (Applied Physics Express) 2013.07.25
134 Nanolithography on Graphene by Using Scanning Scanning Tunneling Microscopy in a Methanol Environment Chulsu Kim, Joonkyu Park, Yongho Seo, Jinho Ahn, and In-Sung Park Microscopy and Microanalysis 2013.07.22
133 Raman spectroscopic image analysis on micropatterned graphene Wooseok Choi, Joonkyu Park, Jongwan Jung, Yongho Seo, Jinho Ahn, In-Sung Park Micro & Nano Letters 2013.04.29
132 Enhanced Light Extraction from Y2O3: Eu3+ Phosphor Films via Vacuum Nano-Imprint Lithography using Spin-on Dielectric Materials Kilbock Lee, Ki-Young Ko, and Jinho Ahn Thin Solid Films 2013.03.05
131 Improved Imaging Properties of Thin Attenuated Phase Shift Masks for Extreme Ultraviolet Lithography Sangsul Lee, Inhwan Lee, Jong Gul Doh, Jae Uk Lee, Seongchul Hong, and Jinho Ahn Journal of Vacuum Science and Technology B 2013.02
130 Dielectric Stacking Effect of Al2O3 and HfO2 in Metal–Insulator–Metal Capacitor In-Sung Park, Kyoung-min Ryu, Jaehack Jeong, and Jinho Ahn IEEE ELECTRON DEVICE LETTERS 2013.01
129 The synthesis of crystalline SnO2 whiskers via a metalorganic chemical vapor dep-osition process Myung Ho Kong, Yong Jung Kwon, Dong Sub Kwak, Tran Van Khai, Jinho Ahn, Kwang Bo Shim, Chongmu Lee, Inpil Kang, No-Hyung Park, Dae-Sup So, Joon Woo Lee and Hyoun Woo Kim Journal of Ceramic Processing Research 2012.12.31
128 Removing graphite flakes for preparing mechanically exfoliated graphene sample Kiyeol Kim, Joonkyu Park, Cheolsoo Kim, Wooseok Choi, Yongho Seo, Jinho Ahn, In-Sung Park Micro & Nano Letters 2012.11.11
127 Evaluation of Lithographic Performance of EUV Mask Using Coherent Scattering Microscope Jonggul Doh, Jae Uk Lee, and Jinho Ahn Journal of Vacuum Sicence & Technology B 2012.11.07
126 Performance of organic field effect transistors with high-k gate oxide after application of consecutive bias stress Sunwoo Lee, Changhwan Choi, Kilbock Lee, Joong Hwee Cho, Ki-Young Ko, Jinho Ahn Thin Solid Films 2012.10.30
125 Effect on Critical Dimension Performance for Carbon Contamination of Extreme Ultraviolet Mask Using Coherent Scattering Microscopy and In-situ Contamination System Jonggul Doh, Sangsul Le, Jaewook Lee , Seongchul Hong, Chang Young Jeong,Dong Gun Lee, Seong-Sue Kim, and Jinho Ahn Japanese Journal of Applied Physics 2012.06.20
124 Atomic Layer Deposition of Dielectrics on Graphene Using Reversibly Physisorbed Ozone Srikar Jandhyala, Greg Mordi, Bongki Lee, Geunsik Lee, Carlo Floresca, Pil-Ryung Cha, Jinho Ahn, Robert M. Wallace, Yves J. Chabal, Moon J. Kim, Luigi Colombo,z Kyeongjae Cho, and Jiyoung Kim ACS Nano 2012.02.21
123 Suppressed Thermally Induced Flatband Voltage Instabilities with Binary Noble Metal Gated Metal–Oxide–Semiconductor Capacitors Changhwan Choi, Jinho Ahn, and Rino Choi Japanese Journal of Applied Physics 2012.02.20
122 Impact of ozone concentration on atomic layer deposited HfO2 on GaAs K. J. Chung, T. J. Park, P. Sivasubramani. J. Kim and J. Ahn Microelectronic Engineering 2012.01
121 Structure, Raman, and photoluminescence properties of SnO2/MgO core-shell nanowires Huh Hoon,Park No-Hyung, Na Han Gil, Kwak Dong Sub, Ahn Jinho, Ham Heon, Shim Kwang Bo, Choi Changhwan, Chang Joon-Hyuk, Lee Chongmu, Kang Inpil, Kong Myung Ho, So Dae-Sup, Lee Joon Woo, Kim Hyoun Woo, Kim Kyoung Hun JOURNAL OF CERAMIC PROCESSING RESEARCH 2011.12.01
120 Annealing-induced enhancement of ferromagnetism in SnO2-core/Cu-shell coaxial nanowires Kim, Hyoun Woo, Na, Han Gil, Yang, Ju Chan, Ahn, Jinho, Yoon, Chong Seung, Ham Heon, Shim Kwang, Choi Changhwan, Kang Inpil, Yang Jae-Hak, Lee Chongmu METALS AND MATERIALS INTERNATIONAL 2011.08.31
119 Carbon contamination of EUV mask and its effect on CD performance Sangsul Lee, Jong Gul Doh, Jae Uk Lee, Inhwan Lee, Chang Young Jeong, Dong Gun Lee, Seung-yu Rah, Jinho Ahn Current Applied Physics 2011.07.14
118 Carbon Contamination Analysis and Its Effect on Extreme Ultra Violet Mask Imaging Performance Using Coherent Scattering Microscopy/In-Situ Accelerated Contamination System Chang Young Jeong, Sangsul Lee, Jong Gul Doh, Jae Uk Lee, Han-sun Cha, William T. Nichols, Dong Gun Lee, Seong Sue Kim, Han Ku Cho, Seung-yu Rah, and Jinho Ahn Journal of Nanoscience and Nanotechnology 2011.07.01
117 Characteristics of CVD graphene nanoribbon formed by a ZnO nanowire Hardmask Chang Goo Kang, Jang Won Kang, Sang Kyung Lee, Seung Yong Lee, Chun Hum Cho, Hyeon Jun Hwang, Young Gon Lee, Jinseong Heo, Hyun-Jong Chung, Heejun Yang, Sunae Seo, Seong-Ju Park, Ki Young Ko, Jinho Ahn and Byoung Hun Lee Nanotechnology 2011.06.14
116 Fabrication of 2D photonic crystal assisted Y2O3:Eu3+ thin-film phosphors Ki-Young Ko, Eun-Jin Her, William T. Nichols, Heon Lee, Young Rag Do, Jinho Ahn Microelectronic Engineering 2011.04.20
115 Improved electrical properties of Pt/HfO2/Ge using in-situ water vapor treatment and atomic layer deposition In-Sung Park, Youngjae Choi, William T. Nichols and Jinho Ahn Applied Physics Letters 2011.03.09
114 Fabrication of trench nanostructures for extreme ultraviolet lithography masks by atomic force microscope lithography Gwangmin Kwon, Kyeongkeun Ko, Haiwon Lee, Woongsun Lim, Geun Young Yeom, Sunwoo Lee, and Jinho Ahn Journal of Vacuum Science & Technology B 2011.01.25
113 Refilled mask structure for Minimizing Shadowing Effect on EUV Lithography inho Ahn, Hyun-Duck Shin, Chang Young Jeong Journal of the semiconductor & Display Technology 2010.12.12
112 Determination of the CD Performance and Carbon Contamination of an EUV Jonggul Doh, Chang Young Jeong, Sangsul Lee, Jae Uk Lee, Han-sun Cha and Jinho Ahn Journal of the Korean Physical Society 2010.12
111 Influence of MEEF Change on the Mask Shadowing Effect in Extreme Ultraviolet Lithography Chang Young Jeong, Sangsul Lee, Hyun-Duck Shin, Tae Geun Kim and Jinho Ahn Microelectronics Engineering 2010.11.28
110 Infinitely high selective inductively coupled plasma etching of an indium tin oxide binary mask structure for extreme ultraviolet lithography Y. R. Park, J. H. Ahn, J. S. Kim, B. S. Kwon, and N.-E. Lee Journal of Vacuum Science & Technology A 2010.06.29
109 Reduced Metal Contamination in Atomic-Layer-Deposited HfO2 Films Grown on Si Using O3 Oxidant Generated Without N2 Assistance Tae Joo Park, Keum Jee Chung, Hyun-Chul Kim, Jinho Ahn, Robert M. Wallace and Jiyoung Kim Electrochemical and Solid-State Letters 2010.05.24
108 Optical properties of TiO2 zigzag films prepared by oblique angle deposition Yong Jun Park, K.M.A. Sobahan, Chang Kwon Hwangbo, Jinho Ahn Journal of the Korean Physical Society 2010.04
107 Dependence of Electrical and Time Stress in Organic Field Effect Transistor with Low Temperature Forming Gas Treated Al2O3 Gate Dielectrics Sunwoo Lee, Keum Jee Chung, In-Sung Park, and Jinho Ahn J Nanosci Nanotechnol 2009.12.09
106 Improvement of imaging properties by optimizing the capping structure in extreme ultraviolet lithography Chang Young Jeong, Sangsul Lee, Hyun-Duck Shin, Tae Geun Kim, and Jinho Ahn Journal of Vacuum Science & Technology B 2009.12.03
105 Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmas H.Y.Jung, Y.R.Park, H.J.Lee, N.-E. Lee, C.Y.jeong, and Jinho Ahn Journal of Vacuum Science & Technology B 2009.11.05
104 Effenct of Attenuated Phase Shift Mask Structure on Extreme Ultraviolet Lithograghy Hyun-Duck Shin, Chang Young Heoung, Tae Geun Kim, Sangsul Lee, In-Sung Park, and Jinho Ahn Japanese Journal of Applied Physics 2009.06.22
103 Electrical characteristics of organic field effect transistor by forming gas treatment of high-k Al2O3 at low temperature Sunwoo Lee, Sang Seol Lee, Jung Ho Park, In-Sung Park, and Jinho Ahn Japanese Journal of Applied Physics 2009.06.22
102 Highly selective dry etching of alternating phase-shift mask (PSM) structures for extreme ultraviolet lithography (EUVL) using inductively coupled plasmas (ICP) H.Y. Jung, Y.R. Park, H.J. Lee, N.-E. Lee., C.Y. Jeong, and Jinho Ahn hin Solid Films 2009.02.04
101 Adhesion force change on multilayer EUVL mask due to laser induced plasma shock wave Tae-Gon Kim, Young-Sam Yoo, Jinho Ahn, Jong-Myoung Lee, Jae-Sung Choi, Ahmed A. Busnaina, Jin-Goo Park Microelectronic Engineering 2009.02
100 Effect of O2 Gas during Inductively Coupled O2/Cl2 Plasma Etching of Mo and HfO2 for Gate Stack Patterning Ho Young JUNG, Hag Joo LEE, Bong Soo KWON, Jung Ho PARK, Chiyoung LEE ,Jinho AHN , Jaegab LEE, and Nae-Eung LEE apanese Journal of Applied Physics 2008.08.22
99 Dry etching of extreme ultraviolet lithography mask structures in inductively coupled plasmas D. Y. Kim, H. J. Lee, H. Y. Jung, N.-E. Lee, T. G. Kim, B. H. Kim, J. Ahn, C. Y. Kim J. Vac. Sci. Technol. 2008.08
98 Mechanically flexible low-leakage multilayer gate dielectrics for flexible organic thin film transistors Y. G. Seol, H. Y. Noh, S. S. Lee, J. H. Ahn and N. E. Lee Applied Physics Latters 2008.07
97 Damage Free Particle Removal from EUVL Mask Layers by High Energy Laser Shock Wave Cleaning Tae-Gon Kim, Young-Sam Yoo, Il-Ryong Son, Tae-Geun Kim, Jinho Ahn, Jong-Myoung Lee, Jae-Sung Choi, Ahmed A. Busnaina, and Jin-Goo Park Japanese Journal of Applied Physics 2008.06
96 Aerial image characteristics of a modified absorber model for extreme ultraviolet lithography In-Yong Kang, Jinho Ahn, Yong-Chae Jung and Hye-Keun Oh Journal of the Korean Physical Society 2008.06
95 Resistance Switching Characteristics of HfO2 Film for Resistance Change Random Access Memory In-Sung Park, Joo-Ho Lee, Sunwoo Lee and Jinho Ahn J. Nanosci. and Nanotechnol 2007.11
94 Effects of additive C4F8 during inductively coupled BCl3/C4F8/Ar plasma etching of TaN and HfO2 for gate stack patterning J. H. Ko, D. Y. Kim, M. S. Park, N.-E. Lee, S. S. Lee, Jinho Ahn, Hyoungsoo Mok J. Vac . Sci. Technol. A 2007.08
93 Theoretical investigation of pattern printability of oxidized Si and Ru capping models for extreme ultraviolet lithography(EUVL) In-Yong Kang, Jinho Ahn, Chung Yong Kim, Hye-Keun Oh, and Yong-Chae Chung Microelectronic Engineering 2007.08
92 SnO2 nanostructures synthesized on Co substrates Hyoun Woo Kim, S.H. Shim, Hae Jin Hwang, Jae Hyun Shim, Nam Hee Cho, Mi Kyoung Park, Hyuck Mo Lee, Byung Tae Ahn, Hyeong Tag Jeon, Jong Wan Park, Jin Ho Ahn, Bo Young Hur Solid State Phenomena 2007.06.16
91 Resistance Switching Characteristics for Nonvolatile Memory Operation of Binary Metal Oxides In-Sung Park, Kyong-Rae Kim, Sangsul Lee, and Jinho Ahn Japanese Journal of Applied Physics 2007.04.24
90 Electrical characteristics of poly (3-hexylthiophene) organic thin film transistor with electroplated metal gate electrodes on polyimide Y. G. Seol, J. G. Lee, N.-E. Lee, Sang Seol Lee and Jinho Ahn Thin Solid Film 2007.04.23
89 Layer-by-layer photonic crystal fabricated by low-temperature atomic layer deposition Jae-Hwang Lee, Wai Leung, Jinho Ahn, Taeho Lee, In-Sung Park, Kristen Constant and Kai-Ming Ho Applied Physics Latters 2007.04.09
88 Growth behavior of oxide nanostructures by electrical and thermal conductivities of substrate in atomic force microscope nano-oxidation Sunwoo Lee, Eol Pyo, Jeong Oh Kim, Jaegeun Noh, Haiwon Lee, and Jinho Ahn Japanese Journal of Applied Physics 2007.02.23
87 Nanoscale patterning using photo-assisted polymer transfer lithography In-Sung Park, Moonik Jang, and Jinho Ahn Microelectronic Engineering 2007.02.02
86 Work function shift mechanism of metal gate electrode with Ru/Ti bilayer In-Sung Park, Han-Kyoung Ko, Taeho Lee, Jungho Park, Duck-Kyun Choi, Jinho Ahn, Min-Ho Park, and Cheol-Woong Yang Electrochem. Solid-State Lett. 2007.02
85 Metal precursor effects on deposition and interfacial characteristics of HfO2 dielectrics grown by atomic layer deposition I.-S. Park, T. Lee, D. Choi and J. Ahn Journal of the Korean Physical Society 2006.12
84 Resistive switching characteristics of HfO2 grown by atomic layer deposition K. Kim, I.-S. Park, J. Hong, S. Lee, B. Choi and J. Ahn Journal of the Korean Physical Society 2006.12
83 Fabrication of two-dimensional periodic structures in silicon by four beam interference lithography G. J. Lee, Y. P. Lee, K. R. Kim, M. I. Jang, J. Ahn, C. Yoon, Y. Son and J. Jang Journal of the Korean Physical Society 2006.12
82 Study of a thin Al2O3/TaN absorber stack on Ru-capped multilayers Tae Geun Kim, Seung Yoon Lee, Chung Yong Kim, Byung Hun Kim, In-Yong Kang, Nae-Eung Lee, Yong-Chae Chung, In-Sung Park, and Jinho Ahn Journal of the Korean Physical Society 2006.12
81 Electrical and Reliability Characteristics of HfO2 MOS Capacitor with Mo Metal Gate Electrode In-sung Park, Taeho Lee, Han-Kyoung Ko, Jin-Ho Ahn Journal of the Korean Physical Society 2006.12
80 Novel Absorber Stack for Minimizing Shadow Effect in EUV Mask Fabrication T. Kim, B. Kim, I. Kang, Y. Chung, J. Ahn, S. Lee, I.-S. Park, C. Kim and N. Lee J. Vac. Sci. Technol. B 2006.11
79 Study on the Characteristics of SiO2 Films Prepared by Hydrogen-assisted Low-pressure Radical Oxidation Using Batch-type Equipment with a 100-wafers of 300-mm-diameter Capability Jae-Jong Han, Kong-Soo Lee, Jung-Geun Jee, Woong Lee, Yong-Woo Hyung, and Hyeon-Deok Lee and Jinho Ahn Journal of the Korean Physical Society 2006.11
78 Electrical properties of atomic layer deposited HfO2 gate dielectric film using deuterium oxide (D2O) as an oxidant for improved reliability T. Lee, H. Ko, J. Ahn, I.-S. Park, H. Sim, H. Park, H. Hwang Japanese Journal of Applied Physics 2006.09
77 Dry etching of TaN/HfO2 gate-stack structure in BCl3/Ar/O2 inductively coupled plasma M. Shin, M. Park, N. Lee, J. Kim, C. Kim and J. Ahn J. Vac. Sci. Technol. A 2006.06
76 Etching characteristics of Ta and TaN using Cl2/Ar inductively coupled plasma M. H. Shin, S. W. Na, N.-E. Lee and J. Ahn Thin Solid Films 2006.05
75 Novel hybrid mask mold for combined nanoimprint and photolithography technique K. Moon, B. Choi, I.-S. Park, S. Hong, K., H. Lee, and J. Ahn Microelectronic Engineering 2006.04
74 Characterization of Ru layer for capping/buffer application in EUVL mask Tae Geun Kim, Seung Yoon Lee, Chung Yong Kim, In-Sung Park, In-Yong Kang, Nae-Eung Lee, Yong-Chae Chung, and Jinho Ahn Microelectronic Engineering 2006.04
73 Investigation of Multilayer Structural Changes in Phase and Amplitude-defects Correction process S. Lee, T. Kim, J. Park, J. Song, O. Kim, C. Yang and J. Ahn J. Vac. Sci. Technol. B 2005.12
72 Photonic band gaps of conformally coated structures R. Biswas, J. Ahn, T. Lee, J.-H. Lee, Y. Kim, C. H. Kim, C. H. Oh and K.-M. Ho J. Opt. Soc. 2005.12
71 Defect Characterization of Ru/Mo/Si EUV Reflector by Optical Modeling I.-Y. Kang, J. Ahn, H.-K. Oh and Y.-C. Chung Journal of the Korean Physical Society 2005.11
70 Dry etching of TaN/HfO2 gate stack structure by Cl2/SF6/Ar Inductively Coupled Plasma M. Shin, S. N, N. Lee, Y. Oh, J. Kim T. Lee and J. Ahn Japanese Journal of Applied Physics 2005.07.26
69 Numerical Investigation of Defect Printability in Extreme Ultraviolet (EUV) Reflector: Ru/Mo/Si Mulitlayer System I.-Y. Kang, J. Ahn, H.-K. Oh and Y.-C. Chung Japanese Journal of Applied Physics 2005.07.26
68 Reduction of the absorber shadow effect by changing the absorber side wall angle in extreme ultraviolet lithography M. Yoo, Y. Jeon, H. Oh and J. Ahn Journal of the Korean Physical Society 2005.04
67 Thermal and electrical properties of TaN electrode on HfO2 gate dielectric T. Lee, H. Ko, Y. Kim and J. Ahn Journal of the Korean Physical Society 2004.11
66 Characteristics of Ru barrier layer in Mo/Ru/Si multilayer for EUV reflector applications T. Kim, S. Lee, J. Park and J. Ahn Journal of the Korean Physical Society 2004.11
65 Nondestructive and destructive characterization of nano-structured multilayer T. Kim, S. Lee, I. Kang, Y. Chung, and J. Ahn Key Engineering Materials 2004.08.25
64 Properties of ultra-thin hafnium oxide and interfacial layer deposited by atomic layer deposition T. Lee, Y. Kim, K. Hong, D. Choi and J. Ahn J. Rare Earths 2004.08
63 Structural characterization of a Mo/Ru/Si extreme ultraviolet reflector by optical modeling I. Kang, T. Kim, S. Lee, J. Ahn and Y. Chung Japanese Journal of Applied Physics 2004.06
62 A simple approach in fabricating chemical sensor using laterally grown multi-walled carbon nanotubes Y. Jang, S. Moon, J. Ahn, Y. Lee and B. Ju Sensors and Actuators B 2004.04
61 Angular dependency of off-axis illumination on 100nm-width pattern printability for extreme ultraviolet lithography: Ru/Mo/Si reflector system I. Kang, Y. Chung, J. Ahn, H. Oh, T. Watanabe and H. Kinoshita J. Vac. Sci. Technol. B 2004
60 Effect of glass-forming elements (Si, Al and Bi) on the characteristics of Zr-based oxide films J. Kim, S. Kong and J. Ahn Journal of the Korean Physical Society 2003.11
59 Enhancement of EUV reflective multilayer properties by the insertion of a Ru barrier layer S. Lee, T. Kim and J. Ahn Journal of the Korean Physical Society 2003.11
58 Structural Analysis of a Mo/Si reflector by optical modeling Kang, C. Chung, Y. Chung, T. Kim, S. Lee and J. Ahn Journal of the Korean Physical Society 2003.11
57 Characterization of atomic-layer-deposited hafnium oxide/SiON stacked-gate dielectrics Y. Kim, M. Kang, T. Lee, J. Ahn and D. Choi J. Vac. Sci. Technol. B 2003.10
56 Fabrication and characteristics of field emitter using carbon nanotues directly grown by thermal chemical vapor deposition Y. Jang, C. Choi, B. Ju, J. Ahn, Y. Lee Thin Solid Films 2003.07.31
55 Enhancement of EUV reflective multilayer properties by the insertion of Ru barrier layer S. Lee, T. Kim and J. Ahn Japanese Journal of Applied Physics 2003.06.30
54 Simple approach to fabricate microgated nanotubes emitter with a side wall protector Y. Jang, C. Choi, B. Ju, J. Ahn and Y. Lee Physics of Condensed Matter 2003.06
53 Effect of NH3 and thickness of catalyst on growth of carbon nanotubes using thermal chemical vapor deposition Y. Jang, J. Ahn, Y. Lee and B. Ju Chem. Phys. Lett. 2003.05.06
52 Lateral growth of aligned multiwalled carbon nanotubes under electric field Y. Jang, J. Ahn, B. Ju and Y. Lee Solid state communications 2003.05
51 Chemical reaction during Pt etching with SF6/Ar and Cl2/Ar plasma chemistries Sang Hoon Kim, Sup Youl Ju, Jae Hee Hwang and Jinho Ahn Japanese Journal of Applied Physics 2003.04.15
50 Characterization of ultra-thin HfO2 gate oxide prepared by using atomic layer deposition T. Lee, J. Ahn, J. Oh, Y. Kim, Y. Kim, D. Choi and J. Jung Journal of the Korean Physical Society 2003.02
49 Characteristics of Platinum films etched with a SF6/Ar plasma Sang Hoon Kim, Soon Woo Lee, Jaehee Hwang and Jinho Ahn Journal of the Korean Physical Society 2003.01.03
48 Suppression of leakage current via formation of a sidewall protector in the microgated carbon nanotube emitter Y. Jang, C. Shoi, B. Ju, J. Ahn and Y. Lee Nanotechnology 2003
47 Microstructure and magnetic properties of nanosized Fe-Co alloy powders synthesized by mechnochemical and mechanical alloying process B. Lee, B. Auhn, D. Kim, S. Oh, H. Jeon, J. Ahn and Y. Lim Mat. Lett. 2003
46 Characteristics of zirconium based deposited by co-sputtering", Integrated Ferroelectrics C. Jeon, S. Kong, H. Shin and J. Ahn, J. Kim Integrated Ferroelectrics 2002.12
45 Application of carbon nanotubes for cathode-ray tube electron gun Yoon-Taek Jang, Yun-Hi Lee, Byeong-Kwon Ju, Jinho Ahn, Chang-Ki Go, Gong-Seok Park Vaccum 2002.10.14
44 Simulation of the optical anomaly in a Mo/Si multilayer system for an EUV reflector I. Kang, Y. Lee, Y. Chung, H. Kim, S. Hur, S. Lee, J. Ahn, C. Yoon, C. Kim Journal of the Korean Physical Society 2002.10
43 Mo/Si multilayer for EUV lithography applications S. Lee, H. Kim, J. Ahn, I. Kang and Y. Chung Journal of the Korean Physical Society 2002.10
42 Tungsten nanowires and their field electron emission properties Yun-Hi Lee, Chang-Hoon Choi, Yoon-Taek Jang, Eun-Kyu Kim, Byeong-Kwon Ju, Nam-Ki Min, and Jinho Ahn Applied Physics Express 2002.06
41 Analysis of multilayer structure for reflection of extreme-ultraviolet wavelength Seung Yoon Lee, Sung Min Hur, Hyung Joon Kim, Chong Seung Yoon, Yong Tae Lee, In Yong Kang, Yong-Chae Chung, Moonsuk Yi, Cheol Kyu Bok, Ohyun Kim and Jinho Ahn Japanese Journal of Applied Physics 2002.06
40 Study of etching mechanism of tantalum thin films by argon actinometry Sang Hoon Kim, Sup Yeol Ju, Kyung Jong Lee and Jinho Ahn Journal of the Korean Physical Society. 2002.01
39 Study on the Application of SiCxNy Thin film as a Mask Membrane for LIGA Chang Mo Park, Tae Ho Lee, Jin Nam Cheon, Seung Yoon Lee, Young Do Kim, Dongwook Shin and Jinho Ahn Journal of the Korean Physical Society 2002.01
38 Actinometry study on the role of fluorine in low-k polyimide etching Sang Hoon Kim, Chang Hee Lee, and Jinho Ahn Journal of the Korean Physical Society 2002.01
37 Influence of hydrogen damages in ferroelectric thin film capacitors June-Mo Koo, Hyung-sub Min, Wonhee Lee,, Jae-Gab Lee, Jiyoung Kim and Jinho Ahn Ferroelectrics 2001
36 Realization of gated field emitters for electrophotonic applications using carbon nanotube line emitters directly grown into submicrometer holes Y. Lee, Y. Jang, D. Kim, J. Ahn and B. Ju Adv. Mater 2001
35 Comparative Study of Ta and its Compounds for Next Generation Lithography Mask Applications K. Kim, S. Lee, C. Park and J. Ahn Journal of the Korean Physical Society 2000.12
34 Deposition and Characterization of Ta, TaNx, and Ta4B Films for NGL Mask Application S. Lee and J. Ahn Japanese Journal of Applied Physics 2000.12
33 Etching Characteristics of fine Ta patterns with Elctron Cyclotron Resonance Chlorine Plasma Sang-Gyun Woo, Sang Hoon Kim, Sup-Yeol Ju, Joo-Hiuk Son and Jinho Ahn Japanese Journal of Applied Physics 2000.12
32 Effects of SF6 addition to O2 plasma on Polyimide Etching Sang Hoon Kim, Sang-Gyun Woo, and Jinho Ahn Japanese Journal of Applied Physics 2000.12
31 Study on the Properties of Interlayer Low Dielectric Polyimide during Cl-based Plasma Etching of Aluminum Sang Hoon Kim, Ho Sung Moon, Sang Gyun Woo and Jinho Ahn Japanese Journal of Applied Physics 1999.12
30 A study on the characteristics of the interlayer low dielectric polyimide during Cl-based plasma etching of aluminium S. Kim, H. Moon and J. Ahn Journal of the Korean Physical Society 1999.12
29 Highly anisotropic etching of tungsten-nitride for x-ray mask absorber with ICP system H. Lee, S. Lee, H. Moon, S. Kim, J. Sohn, and J. Ahn Japanese Journal of Applied Physics 1998.12
28 High transmittance SiC membrane prepared by Electron Cycltron Resonance Plasma Chemical Vapor Deposition in combination with Rapid Thermal Annealing S. Lee, K. Song, J. Kim, J. Sohn, and J. Ahn Japanese Journal of Applied Physics 1998.12
27 A novel anti-reflective structure with Al/SiO2 stack films for metal layer patterning S. Choi, J. Kim, H. Cha, J. Park, J. Ahn, J. Jo, H. Chung, S. Chang, B. Kim Journal of the Korean Physical Society 1998.12
26 Anisotropic etching of tungsten nitride with ICP system H. Lee, C. Jeong, H. Moon, S. Kim, and J. Ahn Journal of the Korean Physical Society 1998.12
25 Deposition of low stress, high transmittance SiC as an X-ray mask membrane using ECR plasma CVD S. Lee, J. Kamg, S. Lim, and J. Ahn Journal of the Korean Physical Society 1998.12
24 Internal stress and microstructure of WNx bilayer films for x-ray masks D. Lee, C. Park, K. Song, Y. Jeon, T. Lee, C. Jeong and J, Ahn Japanese Journal of Applied Physics 1997.12
23 Device performance and reliability of p-channel metal-oxide-semiconductor field effect transistors with chemical-vapor-deposited gate oxides J. Ahn and D. L. Kwong Japanese Journal of Applied Physics 1997.07
22 Ultrahigh-vacuum electron cyclotron resonance-plasma chemical-vapor-deposited SiNX films for X-ray lithography mask membrane: As-deposited properties and radiation stability J. Ahn, K. Suzuki, S. Tsuboi, and Y. Yamashita Japanese Journal of Applied Physics 1994
21 Stress-controlled silicon nitride film with high optical transmittance prepared by an ultra high vacuum electron cyclotron resonance plasma chemical vapor deposition system J. Ahn and K. Suzuki Applied Physics Letters 1994
20 Comparison of the chemical structure and composition between N2O oxides and reoxidized NH3-nitrided oxides M. Bhat, J. Ahn, D. L. Kwong, M. Arent, and J. M. White Applied Physics Letters 1994
19 Oxynitride gate dielectrics for p+-polysilicon MOS devices A. B. Joshi, J. Ahn. and D. L Kwong IEEE Electron Device Letters 1993
18 Thickness uniformity and electrical properties of ultrathin gate oxides grown in N2O ambient by rapid thermal processing G. W. Yoon, A. B. Joshi, J. Ahn, and D. L. Kwong Japanese Journal of Applied Physics 1992
17 Dependence of hot-carrier immunity on channel length and channel width in MOSFET's with N2O-grown gate oxides G. Q. Lo, J. Ahn, and D. L. Kwong IEEE Electron Device Letters 1992
16 Time-dependent dielectric breakdown characteristics of N2O oxide under dynamic stressing J. Ahn, A. Joshi, G. Q. Lo, and D. L. Kwong IEEE Electron Device Letters 1992
15 Improved hot-carrier immunity in CMOS analog device with N2O-nitrided gate oxides G. Q. Lo, J. Ahn, and D. L. Kwong IEEE Electron Device Letters 1992
14 Electrical properties of MOSFET's with N2O-nitrided LPCVD SiO2 gate dielectrics J. Ahn. and D. L. Kwong IEEE Electron Device Letters 1992
13 Suppression of stress-induced leakage current in ultrathin N2O oxides J. Ahn, J. Kim, G. Q. Lo, and D. L. Kwong Applied Physics Letters 1992
12 AC hot-carrier effects in MOSFET's with Furnace N2O-nitrided gate oxides G. Q. Lo, J. Ahn, and D. L. Kwong IEEE Electron Device Letters 1992
11 Thin fluorinated gate dielectrics grown by rapid thermal processing in O2 with diluted NF3 G. Q. Lo, W. Ting, J. Ahn, D. L. Kwong, and J. Kuehne IEEE Trans. Electron Devices 1992
10 High-quality MOSFET's with ultrathin LPCVD gate SiO2 J. Ahn, W. Ting, and D. L. Kwong IEEE Electron Device Letters 1992
9 P-channel MOSFET's with ultrathin N2O gate oxides G. Q. Lo, W. Ting, J. Ahn, and D. L. Kwong IEEE Electron Device Letters 1992
8 Furnace nitridation of thermal SiO2 in pure N2O ambient for ULSI applications J. Ahn, W. Ting, and D. L. Kwong IEEE Electron Device Letters 1992
7 Charge trapping and interface state generation in ultrathin stacked Si3N4/SiO2 gate dielectrics W. Ting, J. Ahn, and D. L. Kwong Journal of Nanoscience and Nanotechnology 1992
6 MOS characteristics of ultrathin SiO2 prepared by oxidizing Si in N2O W. Ting, G. Q. Lo, J. Ahn, T. Y. Chu, and D. L. Kwong IEEE Electron Device Letters 1991
5 Study of the comparison of thin dielectrics grown on Si in a pure N2O ambient T. Chu, W. Ting, J. Ahn, S. Lin, and D. L. Kwong Applied Physics Letters 1991
4 hickness and compositional nonuniformities of ultrathin oxides grown by rapid thermal oxidation of silicon in N2O T. Y. Chu, W. Ting, J. Ahn, and D. L. Kwong J. Electrochem. Soc. 1991
3 High quality ultrathin gate dielectrics formation by thermal oxidation of Si in N2O J. Ahn. W. Ting, T. Chu, S. N. Lin, and D. L. Kwong J. Electrochem. Soc, 1991
2 High quality thin gate oxide prepared by annealing low-pressure chemical vapor deposited SiO2 in N2O J. Ahn. W. Ting, T. Chu, and D. L. Kwong Applied Physics Letters 1991
1 Radiation hardened metal-oxide-semiconductor devices with gate dielectrics grown by rapid thermal processing in O2 with diluted NF3 J. Ahn. G. Q. Lo, W. Ting and D. L. Kwong Applied Physics Letters 1991