| Num | Title | Conference | Author | Date | |
|---|---|---|---|---|---|
| 302 | A novel solution for next-generation EUV pellicle: breathable membrane with increased transmittance | 2024 SPIE Advanced Lithography + Patterning | Haneul Kim, Young-Woo Kang, Jungyeon Kim, Tae Joong Ha and Jinho Ahn | 2024.02.28 | |
| 301 | Vertically tailored hybrid multilayer EUV photoresist with vertical molecular wire structure | 2024 SPIE Advanced Lithography + Patterning | Myung Mo Sung, Hyeonseok Ji, Jaehyuk Lee, Jinho Ahn, Chang Gyoun Kim, Sangsul Lee, Yasin Ekinci, Dimitrios Kazazis, Prajith Karadan | 2024.02.28 | |
| 300 | Modification of electrical and structural properties at interface between Ru and SiGe with annealing | PRICM11 | Jun Hyeong Park, Sung Jun Kim, Young Wook Park, In-Sung Park, and Jinho Ahn | 2023.11.20 | |
| 299 | Comparison of grain growth of poly-Si films deposited with PECVD, LPCVD and sputtering for 3D DRAM application | PRICM11 | Sung Jun Kim, Jun Hyeong Park, Young Wook Park, In-Sung Park, and Jinho Ahn | 2023.11.20 | |
| 298 | The hole-patterned pellicle with a diameter of sub-220 nm as a solution to increase EUV transmittance | MNC 2023 | Jungyeon Kim, Ha Neul Kim, Seong Ju Wi, Young Woo Kang, Won Jin Kim, and Jinho Ahn | 2023.11.17 | |
| 297 | Gas type optimization for dry development of CF4-based plasma on organic-inorganic hybrid EUV photoresist | MNC 2023 | Jiwoo Jung, Ji-Hoo Seok, Hyeonseok Ji, Jaehyuk Lee, In-Sung Park, Myung Mo Sung, and Jinho Ahn | 2023.11.17 | |
| 296 | Experimental investigation of the mask diffraction light blocking with critical-sized Sn particles on EUV pellicle | 2023 SPIE Photomask Technology + EUV Lithography | Seungchan Moon, Dong Gi Lee, Jin Hyuk Choi and Jinho Ahn | 2023.10.02 | |
| 295 | Platinum-based alloy absorber with improved etching properties for next-generation EUV mask | 2023 SPIE Photomask Technology + EUV Lithography | Yunsoo Kim, Dongmin Jeong, Seungho Lee and Jinho Ahn | 2023.10.02 | |
| 294 | Evaluation method for phase shift of EUV light and refractive index using optical flat interferomete | 2023 SPIE Photomask Technology + EUV Lithography | Dong Gi Lee, Seungchan Moon, Jin Hyuk Choi, Seok Ho Song, and Jinho Ahn | 2023.10.02 | |
| 293 | Near-field Infrared Nanoscopic Study of EUV- and ebeam-exposed Hydrogen Silsesquioxane Photoresist | 2023 EUVL Workshop & Supplier Showcase | Jiho Kim, Jin-Kyun Lee, Boknam Chae, Jinho Ahn, Sangsul Lee | 2023.06.06 | |
| 292 | Investigating the Impact of Multi-Emission Layers on the Emissivity of EUV Pellicles | 2023 EUVL Workshop & Supplier Showcase | Young Woo Kang, Seong Ju Wi, Ha Neul Kim, Won Jin Kim, Jungyeon Kim and Jinho Ahn | 2023.06.06 | |
| 291 | High-k Based Near n≈1 EUV Mask for M3D Effects and Focus Control in High-NA Lithography | 2023 EUVL Workshop & Supplier Showcase | Dongmin Jeong, Yunsoo Kim, Seung Ho Lee, and Jinho Ahn | 2023.06.06 | |
| 290 | Metal silicide EUV pellicle and the Effect of Wrinkles on Mask-3D Effects | 2023 EUVL Workshop & Supplier Showcase | Dong Gi Lee, Seungchan Moon, Jinhyuk Choi, Seung Ju Wi and Jinho Ahn | 2023.06.06 | |
| 289 | EUV mask technology | 2023 EUVL Workshop & Supplier Showcase | Jinho Ahn | 2023.06.04 | |
| 288 | Atomic layer etching of TiN with partial sequence of O2 plasma and CF3I plasma | 2023 EDTM | Sung Jun Kim, Seon Yong Kim, In-Sung Park and Jinho Ahn | 2023.03.09 | |
| 287 | Evaluation method for refractive index and extinction coefficient of EUV mask materials | 2023 EDTM | Dong Gi Lee, Seungchan Moon, Jinhyuk Choi, Seok Ho Song, and Jinho Ahn | 2023.03.09 | |
| 286 | Effect of SiNx passivation layer on the radiation efficiency of EUV pellicle | 2023 EDTM | Won Jin Kim, Seong Ju Wi, Haneul Kim, Youngwoo Kang, Jungyeon Kim and Jinho Ahn | 2023.03.09 | |
| 285 | Alternative EUV mask absorber with platinum-based alloy for high-NA EUV lithography | 2023 EDTM | Yunsoo Kim, Dongmin Jeong, Minsun Cho and Jinho Ahn | 2023.03.07 | |
| 284 | Effect of pellicle wrinkles on EUV reflectivity and local critical dimension | 2023 SPIE Advanced Lithography + Patterning | Seungchan Moon, Donggi Lee, Jinhyuk Choi, Jinho Ahn | 2023.03.01 | |
| 283 | Impact of MoSi2 crystal structure on nano-membrane emissivity | 2023 SPIE Advanced Lithography + Patterning | Haneul Kim, Seong Ju Wi, Young-Woo Kang, Wonjin Kim, Jinho Ahn | 2023.03.01 | |
| 282 | Advanced EUV Mask with Platinum-Tungsten Alloy for High-NA EUV Lithography | KISM 2022 | Yunsoo Kim, Dongmin Jeong, Minsun Cho, and Jinho Ahn | 2022.11.15 | |
| 281 | Effect of SiNx Passivation Layer on the Radiation Efficiency of EUV Pellicle | KISM 2022 | Wonjin Kim, Seongju Wi, Haneul Kim, youngwoo Kang, Jungyeon Kim and Jinho Ahn | 2022.11.14 | |
| 280 | Effect of Pellicle Wrinkles on EUV Reflectivity and Local Critical Dimension | KISM 2022 | Seung Chan Moon, Dong Gi Lee, Jinhyuk Choi, and Jinho Ahn | 2022.11.14 | |
| 279 | Effect of pellicle wrinkles on EUV reflectivity and local critical dimension | AsiaNANO 2022 | Seung Chan Moon, Dong Gi Lee, Jinhyuk Choi, and Jinho Ahn | 2022.11.09 | |
| 278 | Effect of SiNx passivation layer on the radiation efficiency of EUV pellicle | AsiaNANO 2022 | Wonjin Kim, Seongju Wi, Haneul Kim, and Jinho Ahn | 2022.11.09 | |
| 277 | Platinum-based EUV mask absorber for high-NA EUV lithography | AsiaNANO 2022 | Yunsoo Kim, Dongmin Jeong, Minsun Cho, and Jinho Ahn | 2022.11.09 | |
| 276 | Masks and Pellicles for HVM EUV Lithography | MNC 2022 | Jinho Ahn | 2022.11.08 | |
| 275 | Experimental Demonstration for the Effect of EUV Pellicle Wrinkles on Mask 3D Effect and Mask Imaging Performance | ENGE 2022 | Jin Hyuk Choi, Dong Gi Lee, Young Woong Kim, Seung Chan Moon, Seong Ju Wi, and Jinho Ahn | 2022.11.07 | |
| 274 | EUV Mask Performance Enhancement Through Controlling Mask Bias for C/H Patterns | ENGE 2022 | Minsun Cho, Dongmin Jeong, Yunsoo Kim, and Jinho Ahn | 2022.11.07 | |
| 273 | Evaluating Optical/Mechanical Properties of Single MoSi2 EUV Pellicle | ENGE 2022 | Won Jin Kim, Seong Ju Wi, Ha Neul Kim, Youngwoo Kang, Jung Yeon Kim and Jinho Ahn | 2022.11.07 | |
| 272 | Impact of Thermo-Mechanical Properties of EUV Pellicle on Critical Dimension Uniformity | ENGE 2022 | Youngwoo Kang, Junghwan Kim, Ha Neul Kim and Jinho Ahn | 2022.11.07 | |
| 271 | Large Scale Nanometer-thickness Molybdenum Carbide Membrane for Extreme Ultraviolet Pellicle | ENGE 2022 | Yongkyung Kim, Kihun Seong, Sung Kyu Jang, Hyun-Mi Kim, Jin Woo Cho, Hyeongkeun Kim, Seul-Gi Kim and Jinho Ahn | 2022.11.07 | |
| 270 | Materials Science in EUV Lithography | ENGE 2022 | Jinho Ahn | 2022.11.07 | |
| 269 | EUV mask technology | 2022 Source Workshop | Jinho Ahn | 2022.10.22 | |
| 268 | Feasibility of nanometer-thickness molybdenum carbide film for extreme ultraviolet pellicle | 2022 SPIE Photomask Technology + EUV Lithography | Yongkyung Kim, Kihun Seong, Donggi Lee, Seungchan Moon, Hyun-Mi Kim, Hyeongkeun Kim, Seul-Gi Kim and Jinho Ahn | 2022.09.28 | |
| 267 | Experimental demonstration for the influence of EUV pellicle wrinkles on the mask 3D effects | 2022 SPIE Photomask Technology + EUV Lithography | Donggi Lee, Young Woong Kim, Seung Chan Moon, Jinhyuk Choi and Jinho Ahn | 2022.09.28 | |
| 266 | Investigation of ZrSi2 for application to EUV pellicle | 2022 SPIE Photomask Technology + EUV Lithography | Seong Ju Wi, Chang Soo Kim, Ha Neul Kim, and Jinho Ahn | 2022.09.28 | |
| 265 | Alternative EUV mask with platinum-tungsten alloy for high-NA EUV lithography | 2022 SPIE Photomask Technology + EUV Lithography | Yunsoo Kim, Dongmin Jeong, Minsun Cho, and Jinho Ahn | 2022.09.26 | |
| 264 | Effect of wrinkles on pellicle reflectivity and local critical dimension | 2022 EUVL Workshop & Supplier Showcase | Seung Chan Moon, Dong Gi Lee, Young Woong Kim, and Jinho Ahn | 2022.06.09 | |
| 263 | Generation of wrinkles and its effect on the performance of EUV pellicles | 2022 EUVL Workshop & Supplier Showcase | Donggi Lee, Young Woon Kim, Seung Chan Moon, and Jinho Ahn | 2022.06.08 | |
| 262 | Optimization of the diffraction phase effect for EUV phase shift mask | 2022 EUVL Workshop & Supplier Showcase | Dongmin Jeong, Yunsoo Kim, Minsun Cho, and Jinho Ahn | 2022.06.07 | |
| 261 | EUV mask technology | 2022 EUVL Workshop & Supplier Showcase | Jinho Ahn | 2022.06.05 | |
| 260 | Impact of thermal expansion coefficient on the local tilt angle of extreme ultraviolet pellicle | 2022 SPIE Advanced Lithography + Patterning | Chang Soo Kim, Jung Hwan Kim, Seong Ju Wi, Ha Neul Kim, Won Jin Kim and Jinho Ahn | 2022.04.27 | |
| 259 | Effect of diffraction phase control for EUV phase shift mask | 2022 SPIE Advanced Lithography + Patterning | Dongmin Jeong, Deukgyu Kim, Yunsoo Kim, Minsun Cho, and Jinho Ahn | 2022.04.27 | |
| 258 | Atomic layer etching of SiO2 and TiN films with non-greenhouse gas of CF3I | 5th ICASS | Seon Yong Kim, In-Sung Park, and Jinho Ahn | 2022.04.26 | |
| 257 | Diffraction properties optimization for EUV mask imaging performance enhancement | 2021 HYU-JLU-FCU Joint Symposium | Yunsoo Kim, Dongmin Jeong, Deukgyu Kim, Minsun Cho, and Jinho Ahn | 2021.12.10 | |
| 256 | Actinic photomask imaging using EUV ptychography microscope | 2021 HYU-JLU-FCU Joint Symposium | Young Woong Kim, Dong Gi Lee, Chang Mo Ku, Seungchan Moon, Joong Hwee Jcho and Jinho Ahn | 2021.12.10 | |
| 255 | EUV Lithography | imec-HYU workshop | Jinho Ahn | 2021.11.26 | |
| 254 | EUV Lithography A successful Next Generation Lithography Technology | 2021 ICTFAB | Jinho Ahn | 2021.11.15 | |
| 253 | EUV photomask technology | 2021 Source Workshop | Jinho Ahn | 2021.10.23 | |
| 252 | Effect of wrinkles on pellicle reflectivity and local critical dimension | 2021 EUVL Symposium | Dong gi Lee, Young Woong Kim, Seungchan Moon, Jinho Ahn | 2021.09.28 | |
| 251 | Recent research activities in EUV-IUCC (Industry-University Collaboration Center) | 2021 EUVL Supplier Showcase | Jinho Ahn | 2021.08.16 | |
| 250 | Atomic layer etching of titanium nitride with O2 plasma and CF3I plasma | ALD 2021 | Seon Yong Kim, Sang Hyu Shin, In-Sung Park, Jinho Ahn | 2021.06.27 | |
| 249 | Analyzing the cause for EUV transmittance reduction of EUV pellicle during exposure process | 2021 EUVL Workshop | Chang Soo Kim, Yong Ju Jang, Seong Ju Wi, Ha Neul Kim and Jinho Ahn | 2021.06.09 | |
| 248 | EUV mask imaging performance enhancement through aerial image optimization | 2021 EUVL Workshop | Deukgyu Kim, Dongmin Jeong, Yunsoo Kim, Minsun Cho, and Jinho Ahn | 2021.06.09 | |
| 247 | Materials perspectives for EUV pellicle solutions | 2021 EUVL Workshop | Jinho Ahn | 2021.06.08 | |
| 246 | Short course | 2021 EUVL Workshop | Jinho Ahn | 2021.06.07 | |
| 245 | Fabrication and evaluation of Nickel-based high-k mask for high numerical aperture extreme ultraviolet lithography | 2021 SPIE Advanced Lithography | Dongmin Jeong, Yoon Jong Han, Deuk Gyu Kim, Yunsoo Kim and Jinho Ahn | 2021.02.22 | |
| 244 | Experimental validation of particle impact on thermo-mechanical behavior of EUV pellicle | 2021 SPIE Advanced Lithography | Yong Ju Jang, Seong Ju Wi, Ha Neul Kim, Chang Soo Kim and Jinho Ahn | 2021.02.22 | |
| 243 | Actinic mask imaging using EUV ptychography microscope | 2021 SPIE Advanced Lithography | Young Woong Kim, Byungmin Yoo, Dong Gi Lee, Chang Mo Ku, Joong Hwee Jcho and Jinho Ahn | 2021.02.22 | |
| 242 | Atomic Layer Etching of Silicon Oxide with CF3I and O2 Plasma | PRiME 2020 | Seon Yong Kim, Taehoon Lee, In-Sung Park, Jinho Ahn | 2020.10.04 | |
| 241 | Evaluating optical/thermal properties of MoSi2 EUV pellicle | The 28th Korean Conference on Semiconductors | Ha Neul Kim, Yong Ju Jang, Seong Ju Wi, Chang Soo Kim, and Jinho Ahn | 2020.09.20 | |
| 240 | Multi-stack Ni absorber EUV mask for high numerical aperture extreme ultraviolet lithography | 2020 EUVL Workshop | Yoon Jong Han, Dongmin Jeong, and Jinho Ahn | 2020.06.10 | |
| 239 | EUV pellicle defect review using EUV ptychography microscope | 2020 EUVL Workshop | Byungmin Yoo, Dong Gon Woo, Young Woong Kim, Young Ju Jang, Seong Ju Wi and Jinho Ahn | 2020.06.10 | |
| 238 | Pathfinding the Novel Absorber Materials for High-NA EUV lithography (Invited) | 2020 EUVL Workshop | Jinho Ahn | 2020.06.10 | |
| 237 | EUVL short course | 2020 EUVL Workshop | Jinho Ahn | 2020.06.07 | |
| 236 | EUV Lithography | 2020 SPIE Advanced Lithography | Jinho Ahn | 2020.02.23 | |
| 235 | Thermo-mechanical characteristics of particle-contaminated pellicle membrane for extreme ultraviolet lithography | MNC 2019 | Dongmin Jeong , Yong Ju Jang, Seong Ju Wi, Ha Neul Kim and Jinho Ahn | 2019.10.31 | |
| 234 | Multilayer absorber phase shift mask using platinum for high numerical aperture extreme ultraviolet lithography | MNC 2019 | Donming Jeong, Jung sik kim, Yoon Jong Han and Jinho Ahn | 2019.10.31 | |
| 233 | Electrical Characteristics of Double Back Gate Z2-FET on Sub 10nm SOI | MNC 2019 | Sehyun Kwon, Francisco Gamiz, Philippe Galy, Sorin Cristoloveanu, Jinho Ahn and Yong Tae Kim | 2019.10.31 | |
| 232 | Fe3O4/ZnO core shell nanoparticles fabricated by atomic layer deposition and its application for drug delivery agent | MNC 2019 | Sejong Seong, Taehoon Lee, Seon Yong Kim, In-Sung Park and Jinho Ahn | 2019.10.29 | |
| 231 | Multilayer absorber phase shift mask using platinum for high numerical aperture extreme ultraviolet lithography | 2019 EUVL symposium | Dongmin Jeong, Jung Sik Kim, Yoon Jong Han, Jinho Ahn | 2019.09.16 | |
| 230 | Through-pellicle inspection using EUV ptychography microscope | 2019 EUVL symposium | Young Woong Kim, Dong Gon Woo, Yong Ju Jang, Seong Ju Wi, Jinho Ahn, Seunghyeok Shin, Whoi-Yul Kim | 2019.09.16 | |
| 229 | ALD of Metal Oxides Fabricated by using La(NO3)3∙6H2O Oxidant and their applications | ALD/ALE 2019 | In-Sung Park, Seon Yong Kim, Sejong Seong, Taehoon Lee, Yong Chan Jung and Jinho Ahn | 2019.07.22 | |
| 228 | Thermo-mechanical Characteristics of EUV Pellicle with Particle Contamination | 2019 EUVL Workshop | Ha Neul Kim, Yong Ju Jang, Seong Ju Wi, and Jinho Ahn | 2019.06.12 | |
| 227 | Development of EUV-ptychography Microscope: EUV Scanning Lensless Imaging (ESLI) | 2019 EUVL Workshop | Dong Gon Woo, Young Woong Kim, Yong Ju Jang, Seong Ju Wi, Seung Hyuk Shin, Whoi-Yul Kim and Jinho Ahn | 2019.06.12 | |
| 226 | Fabrication and Evaluation of SiN-based EUV Pellicle | 2019 EUVL Workshop | Ha Neul Kim, Yong Ju Jang, Seong Ju Wi, Juhee Hong, Chang Hoon Lee, Kee Soo Nam and Jinho Ahn | 2019.06.12 | |
| 225 | Reliable operation of reconfigurable Z2-FET for memory matrix and register | 5th Joint EUROSOI ULIS 2019 Conference | Sehyun Kwon, Carlos Navarro, Philippe Galy, Sorin Cristoloveanu, Jinho Ahn, Young Min Jhon, Francisco Gamiz, and Yong Tae Kim | 2019.04.01 | |
| 224 | Fabrication and evaluation of phase shift mask using platinum for high numerical aperture extreme ultraviolet lithography | 2019 SPIE Advanced Lithography | Jung Sik Kim, Dong Gon Woo, Dong Min Jeong and Jinho Ahn | 2019.02.27 | |
| 223 | EUV Lithography | 2019 SPIE Advanced Lithography | Jinho Ahn | 2019.02.24 | |
| 222 | Microstructure and Eelectrical Properties of HfO2 Thin Films Using La(NO3)3·6H2O Solution as an Oxidant | MNC 2018 | Seon Yong Kim, Yong Chan Jung, Sejong Seong, Taehoon Lee, In-Sung Park and Jinho Ahn | 2018.11.16 | |
| 221 | Wide Thermal Anneal System for Uniform Improvement of IGZO Thin Films | ENGE 2018 | Taehoon Lee, Yong Chan Jung, Sejong Seong, Seon Yong Kim, In-Sung Park and Jinho Ahn | 2018.11.14 | |
| 220 | Microstructure and Eelectrical Properties of HfO2 Thin Films Using La(NO3)3·6H2O Solution as an Oxidant | ENGE 2018 | Seon Yong Kim, Yong Chan Jung, Sejong Seong, Taehoon Lee, In-Sung Park and Jinho Ahn | 2018.11.12 | |
| 219 | Mask Materials and Designs for Extremes Ultra Violet Lithography | ENGE 2018 | Jinho Ahn | 2018.11.12 | |
| 218 | Optical, Structural, and Resistive switching Characteristics of Atomic-Layer-Deposited ZnO Films with Their Thickness Variation | Americas International Meeting on Electrochemistry and Solid State Science 2018 | Taehoon Lee, Yong Chan Jung, Sejong Seong, Seon Yong Kim, In-Sung Park and Jinho Ahn | 2018.10.01 | |
| 217 | Maximizing thermal emission characteristics of EUV pellicle | 2018 EUVL symposium | Yong Ju Jang, Seong Ju Wi, Juhee Hong, Kee Soo Nam, and Jinho Ahn | 2018.09.17 | |
| 216 | Memory characteristics of band modulated FET on nano SOI | 2018 International Conference on Solid State Devices and Materials | Sehyun Kwon, Jinho Ahn, Sorin Cristoloveanu, Francisco Gamiz, Carlos Navarro, Philippe Galy, Young Min Jhon, and Yong Tae Kim | 2018.09.13 | |
| 215 | Fabrication of Multi-Functional Core/Shell Nanoparticles Using Atomic Layer Deposition Technology | 5th International Conference on Materials Science & Smart Materials | Sejong Seong, Yong Chan Jung, Taehoon Lee, Seon Yong Kim, In-Sung Park and Jinho Ahn | 2018.08.08 | |
| 214 | Evaluating thermal and mechanical properties of composite films for EUV pellicle applications | 2018 EUVL workshop | Seong Ju Wi, Yong Ju Jang, Jinho Ahn | 2018.06.13 | |
| 213 | Thin-oxide Z2-FET Reliability | Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon | Sehyun Kwon, Carlos Navarro, Francisco Gamiz, Philippe Galy, Asen Asenov, Sorin Cristoloveanu, Jinho Ahn, and Yong Tae Kim | 2018.03.19 | |
| 212 | The Resistive Switching Characteristics of Nanocrystalline HfO2 Films Grown by Fast Atomic Layer Deposition with La(NO3)36H20 Solution | 2017 MRS Fall Meeting & Exhibit | Yong Chan Jung, Sejong Seong, Taehoon Lee, Seon Yong Kim, In-sung Park, Jinho Ahn | 2017.11.28 | |
| 211 | Design of Phase-change Material with Distortion Effect by Dopants | 2017 MRS Fall Meeting & Exhibit | Minho Choi, Heechae Choi, Sehyun Kwon, Seungchul Kim, Kwang-Ryeol Lee, Jinho Ahn, and Yong Tae Kim | 2017.11.28 | |
| 210 | Multi-functional Core/Shell Nanoparticles Fabricated by Atomic Layer Deposition Technology | The 30th International Microprocesses and Nanotechnology Conference | Sejong Seong, Yong Chan Jung, Taehoon Lee, In-sung Park, Kichun Yoo, Sujae Lee, Jinho Ahn | 2017.11.09 | |
| 209 | Characteristics of silicon nitride composites for EUV pellicle application | The 30th International Microprocesses and Nanotechnology Conference | Yong Ju Jang, Jung Hwan Kim, Jinho Ahn | 2017.11.08 | |
| 208 | Development of EUV actinic inspection technique: EUV scanning lensless imaging (ESLI) | The 30th International Microprocesses and Nanotechnology Conference | 우동곤, 김영웅, 김정환, 신승혁, 김회율, 안진호 | 2017.11.08 | |
| 207 | Resistive Switching Parameter Improvement of Pt/HfO2/Pt Resistor by Applying Voltage Bias Polarity | The 30th International Microprocesses and Nanotechnology Conference | Yong Chan Jung, Sejong Seong, Taehoon Lee, Seon Yong Kim, In-sung Park, Jinho Ahn | 2017.11.07 | |
| 206 | Characteristics of Z2-FET : Capacitorless 1T-DRAM device | The 4th International Symposium on Hybrid Materials and Processing | Sehyun Kwon, Minho Choi, Sorin Cristoloveanu, Yong Tae Kim, Jinho Ahn | 2017.11.07 | |
| 205 | Using platinum for absorber stack of phase shift mask in high numerical aperture extreme ultraviolet lithography | The 30th International Microprocesses and Nanotechnology Conference | Jung Sik Kim, Dong Gon Woo, and Jinho Ahn | 2017.11.06 | |
| 204 | Wide Thermal Annealing System and its Effects on ITO and IGZO Thin Films | The 4th International Symposium on Hybrid Materials and Processing | Sejong Seong, Yong Chan Jung, Taehoon Lee, Seon Yong Kim, In-sung Park, Jinho Ahn | 2017.11.06 | |
| 203 | Evaluating mechanical and thermal characteristics of SiNx EUV pellicle membrane | 2017 EUVL symposium | Yong Ju Jang, Jung Hwan Kim and Jinho Ahn | 2017.09.13 | |
| 202 | Characteristics of sharp switching capacitorless 1T-DRAM device | AWAD 2017 | Sehyun Kwon, Minho Choi, Sorin Cristoloveanu, Chunkeun Kim, Yong Tae Kim, Jinho Ahn | 2017.07.04 | |
| 201 | Improved photoluminescence intensity of quasicrystal patterned Y2O3:Eu3+ thin-film phosphors | 2017 International Forum on Functional Materials (IFFM 2017) | Hyojun Kim, Ki-Young Ko, In-Sung Park, Jinho Ahn | 2017.06.27 | |
| 200 | Surface smoothness effect on MoS2 fabrication on HfO2 dielectric films | ICASS 2017 | Bo Li, Yong Chan Jung, Sejong Seong, Taehoon Lee, In-Sung Park, and Jinho Ahn | 2017.06.14 | |
| 199 | Improved Resistive Switching Characteristics of ZnO on metal-capped ITO electrode for transparent flexible devices | ICASS 2017 | Taehoon Lee, Yong Chan Jung, Sejong Seong, Bo Li, Seon Yong Kim, Hyun Jun Hwang, Hak-sung Kim, In-Sung Park, and Jinho Ahn | 2017.06.14 | |
| 198 | Photocatalytic ZnO thin shell layers coating on plasmonic metal nanoparticles by using atomic layer deposition technology | ICASS 2017 | Sejong Seong, Yong Chan Jung, Taehoon Lee, Bo Li, In-Sung Park, Jinho Ahn | 2017.06.14 | |
| 197 | Impact of interfaces near anode in resistive switching of Pt/HfO2/Pt by electroforming | ICASS 2017 | Yong Chan Jung, Sejong Seong, Taehoon Lee, Bo Li, Seong Yong Kim, In-Sung Park, Jinho Ahn | 2017.06.14 | |
| 196 | Improved Inspection Ability of Coherent Scattering Microscopy by Applying Ptychography | 2017 International Workshop on EUV Lithography | Young Woong Kim, Dong Gon Woo, Seung Hyuk Shin, Hoon Jo, Whoi-Yul Kim and Jinho Ahn | 2017.06.14 | |
| 195 | Effect of IPL Treatment on the Electical Characteristics of Trasparent Metal/ZnO/ITO/PET resistor | ENGE 2016 | Taehoon Lee, Yong Chan Jung, Sejong Seong, Bo Li, Hyun-Jun Hwang, Hak-Sung Kim, In-Sung Park, Jinho Ahn | 2016.11.08 | |
| 194 | Effects of Vacancy and Distortion in In3SbTe2 Phase-change Material by Bi Dopant | ENGE 2016 | Minho Choi, Heechae Choi, Yong Tae Kim, and Jinho Ahn | 2016.11.08 | |
| 193 | Effects of Fully Depleted SOI on Ultra-fast Swing Slope of 1T-DRAM Memory | ENGE 2016 | Sehyun Kwon, Minho Choi, Yong Tae Kim, In-Sung Park, Jinho Ahn, Sorin Cristoloveanu | 2016.11.08 | |
| 192 | Fe3O4-ZnO Core-Shell Nanoparticles Fabricated by Rotational Atomic Layer Deposition for Multifunctional Applications | ENGE 2016 | Sejong Seong, Yong Chan Jung, Taehoon Lee, Bo Li, In-Sung Park, Jinho Ahn | 2016.11.07 | |
| 191 | Manufacturing Large-scale SiNx EUV lithography Pellicle using Waterbath Wet Etching Method | ENGE 2016 | Seonghoon Jeong, Jung Hwan Kim, Seong Chul Hong, Jinho Ahn | 2016.11.07 | |
| 190 | Mechanical and optical performance evaluation of graphene composite EUV pellicle | ENGE 2016 | Yong Ju Jang, Jung Hwan Kim, Seongchul Hong, Jinho Ahn | 2016.11.07 | |
| 189 | Improvement of Coherent Scattering microscopy: from HIO to PIE | ENGE 2016 | Dong Gon Woo, Seongchul Hong, Hoon Jo, Whoi-Yul Kim, Jinho Ahn | 2016.11.07 | |
| 188 | Study of correlation of missing hole with side lobe intensity and photon shot noise effect in extreme ultraviolet lithography | ENGE 2016 | Jung Sik Kim, Seongchul Hong, Yong Ju Jang, Jinho Ahn | 2016.11.07 | |
| 187 | Improvement of SRAF application margin and imaging performance of isolated patterns by using attenuated phase shift mask | 2016 International Symposium on EUV Lithography | Jung Sik Kim, Seongchul Hong, Yong Ju Jang, Jinho Ahn | 2016.10.24 | |
| 186 | Improved margin of absorber sidewall angle using phase shifting extreme ultraviolet mask | 2016 International Symposium on EUV Lithography | Yong Ju Jang, Seongchul Hong, Jung Sik Kim, Jinho Ahn | 2016.10.24 | |
| 185 | Atomic Layer Deposition for the Fabrication of Nano-materials with Core/shell Structure and their Multi-functional Properties | The 3rd International Confernece on ALD Applications 2016 China Atomic Layer Deposition | Sejong Seong, Yong Chan Jung, Taehoon Lee, Bo Li, In-Sung Park, Jinho Ahn | 2016.10.19 | |
| 184 | Surface Smoothness Enhancement of Atomic Layer Deopsited HfO2 Film | The 3rd International Confernece on ALD Applications 2016 China Atomic Layer Deposition | Bo Li, Yong Chan Jung, Sejong Seong, Taehoon Lee, In-Sung Park, Jinho Ahn | 2016.10.17 | |
| 183 | Characteristics of Floating Body Capacitorless 1T-DRAM Memory | AWAD 2016 Japan | Sehyun Kwon, Minho Choi, Jinho Ahn, In Sung Park, Yong Tae Kim | 2016.07.04 | |
| 182 | Improvement of Coherent Scattering Microscopy by applying Ptychographical Iterative Engine | 2016 EUVL WORKSHOP | Dong Gon Woo, Seongchul Hong, Hoon Jo, Whoi-Yul Kim, and Jinho Ahn | 2016.06.16 | |
| 181 | Improvement on In3SbTe2 phase-change material by Bi doping with vacancy and distortion | MRS 2016 Spring | Minho Choi, Heechae Choi, Seungchul Kim, Yong Tae Kim, Jinho Ahn | 2016.03.30 | |
| 180 | Improvement on operation speed of In3SbTe2 phase change material by adding Bi element | 2015 E-MRS (European Materials Research Society) | Minho Choi, Yong Tae, Kim, Woon Jo Cho, Young-Hwan Kim, Seong Il Kim, Chun Keun Kim, Jinho Ahn | 2015.05.13 | |
| 179 | Evaluation of optical properties of EUV resist underlayer | SPIE 학회 | Jung Sik Kim, Seongchul Hong, Jae Uk Lee, Seung Min Lee, Jung Hwan Kim, Hyun Min Song, Jinho Ahn | 2015.02.24 | |
| 178 | Evaluating performance of micron-scale Ag grids as a transparent electrode | ENGE 2014 | 이길복, 안진호 | 2014.11.18 | |
| 177 | Suggestion of Composite EUVL pellicle Materials | ENGE 2014 | 김정환, 홍성철, 이재욱, 이승민, 김정식, 송현민, 이덕연, 김성인, 안진호 | 2014.11.18 | |
| 176 | Fabrication and Analysis of Core/Shell Nano-composites using Atomic layer Deposition | ENGE 2014 | 성세종, 정용찬, 이태훈, 박인성, 안진호 | 2014.11.17 | |
| 175 | Wide Voltage Operation for Resistive Switching in Metal/Hf02/Metal Resistors | ENGE 2014 | 정용찬, 성세종, 이태훈, 박인성, 안진호 | 2014.11.17 | |
| 174 | The Effect of Bi-doping on the Phase Change Properties of In3SbTe2 | ENGE 2014 | 최민호, 김용태, 안진호 | 2014.11.17 | |
| 173 | Improvement of stochastic imaging performance in contact hole pattern by using attenuated phase-shift mask for EUVL | ENGE 2014 | 김정식, 홍성철, 이재욱, 이승민, 김정환, 송현민, 안진호 | 2014.11.17 | |
| 172 | The Suggestion of Half-Tone Phase-Shift mask for High-NA Extreme Ultraviolet Lithography | MNC 2014 | Seongchul Hong, Jae Uk Lee, Seung Min Lee, Jung Hwan Kim, Jungsik Kim, Hyun Min Song and Jinho Ahn | 2014.11.04 | |
| 171 | Evaluation of metal absorber materials for beyond extreme ultraviolet lithography | ICMAP | Seongchul Hong, Jungsik Kim, , Jae Uk Lee, Seung Min Lee, Jung Hwan Kim, Hyun Min Song and Jinho Ahn | 2014.07.09 | |
| 170 | The variation of the enhanced PL efficiency of Y2O3:Eu3+ phosphor films with the height to the ZrO2 nanoparticle PCLs by nano-imprint method | ICMAP | Culkyun Park, Hyojun Kim, Ki-Young Ko, Ki Kang Kim and Jinho Ahn | 2014.07.08 | |
| 169 | 2D TiO2 nanoparticle photonic crystal patterned Y3AI5O12:Ce3+ phosphor plate for white light-emitting diodes | ICMAP | Culkyun Park, Hyojun Kim, Ki-Young Ko, Ki Kang Kim and Jinho Ahn | 2014.07.08 | |
| 168 | Improvement of multi-level phase changing properties of SbTe based chalcogenide material by substituting In for Ge | AWAD 2014 Japan | Yong Tae Kim, Chun Keun Kim, Minho Choi, Jin-Ho Ahn | 2014.07.01 | |
| 167 | Improved Stochastic Imaging Properties in Contact Hole Pattern By Using Attenuated PSM for EUVL | 2014 International Workshop on EUV Lithography | Jungsik Kim, Seongchul Hong, Jae Uk Lee, Seung Min Lee, Jung Hwan Kim, Hyun Min Song and Jinho Ahn | 2014.06.26 | |
| 166 | Double Side Patterned Y3AI5O12:Ce3+ Phosphor Plate for White Light-Emitting Diodes | The 5th International Conference on White LEDs and Solid State Lingting | Culkyun Park, Hyojun Kim, Ki-Young Ko and Jinho Ahn | 2014.06.05 | |
| 165 | Improved switching speed of InSbTe multi-level phase change memory | 2014 E-MRS (European Materials Research Society) Spring | Yong Tae Kim, Minho Choi | 2014.05.27 | |
| 164 | Imaging performance of attenuated phase-shift mask using coherent scattering microscope | 2014 SPIE Advanced Lithography | Jae Uk Lee, Seong Chul Hong, Seung Min Lee , Jung Sik Kim, Keun yong Jung, Joong hwee Cho and Jinho Ahn | 2014.02.25 | |
| 163 | The role of Bi dopant in In3SbTe2 phase change material | International Conference on Advanced Electromaterials (ICAE 2013) | Minho Choi, Yongtae Kim, Jinho Ahn | 2013.11.15 | |
| 162 | Optimization of mask structure for high-NA EUVL | 2013 International Symposium on EUV Lithography | Seoung Chul Hong, Jae Uk Lee, Seejun Jeong, Seung Min Lee, Jung Sik Kim and Jinho Ahn | 2013.10.07 | |
| 161 | Time dependent precursor quality variation of liquid CpZr(DMA)3 and its ALD-ZrO2 film | 13th International Conference on Atomic Layer Deposition | Sejong Seong, Yong Chan Jeong, Myungwan Lee, In-Sung Park and Jinho Ahn | 2013.07.28 | |
| 160 | Calculation of the Optical Constants Using X-ray Reflectometer for Verifying the Optical Design of the Attenuated Phase Shift Mask | 2013 EUVL workshop on EUV Lithography | Seung Min Lee, Jae Uk Lee, Seongchul Hong , Seejun Jeong , Jung Sik Kim and Jinho Ahn | 2013.06.10 | |
| 159 | Imporved Photon Shot Noise Effect on LWR by using attenuated PSM for EUVL | 2013 International Workshop on EUV Lithography | Seejun Jeong, Seoung Chul Hong, Jae Uk Lee, Seung Min Lee, Jung Sik Kim and Jinho Ahn | 2013.06.10 | |
| 158 | The Effects of Bi Doping on the Properties of In3SbTe2 for Multi-level Phase Change Memory Device | 2013 MRS Spring Meeting | Minho Choi, Yong Tae Kim, and Jinho Ahn | 2013.04.05 | |
| 157 | Stochastic Resist Patterning Simulation using Attenuated PSM for EUV Lithography | 2013 SPIE Advanced Lithography | Seongchul Hong, Seejun Jeong, Jae Uk Lee, Seung Min Lee, Jongseok Kim, Jonggul Doh and Jinho Ahn | 2013.02.27 | |
| 156 | Characterization of ZnO films deposited by sol-gel technique | 2012 Collaborative Conference on Crystal Growth(3CG) | Kilbock Lee, Jihno Ahn, In-sung, Park, Anna Reymers, M. Arzakantsyan, V. Gevorgyan | 2012.12.12 | |
| 155 | Enhanced light extraction from red phosphor films via nano-imprint lithography using zirconia nanoparticles | MNC 2012 | Ki-Kang Kim, Eun-Jin Her, Ki-Young Ko, Tae Hee Won and Jinho Ahn | 2012.11.01 | |
| 154 | Fabrication of 2D TiO2 nanoparticles PCLs by vacuum nano-imprint lithography and atomic layer deposition method | International Conference on Electronic Materials and Nanotechnology for Green Environment (ENGE2012) | 김기강,허은진 | 2012.09.19 | |
| 153 | Actinic inspection of EUV mask using Coherent Scattering Microscope | ENGE 2012 | Jae Uk Lee, Sangsul Lee, Jong Gul Doh, Seong Chul Hong, Seung Min Lee and Jinho Ahn | 2012.09.19 | |
| 152 | Fabrication of 2D TiO2 nanoparticles PCLs by vacuum nano-imprint lithography and atomic layer deposition method | ENGE 2012 | Ki-Kang Kim, Ki-Young Ko and Jinho Ahn | 2012.09.19 | |
| 151 | Microstructures of HfO2 Thin Films on Si and Ge Evaluated Using Small Angle Neutron Scattering | International Union of Materials Research Societies -International Conference in Asia 2012 | Tae-Gyu Shin, Baek-Seok Seong, Kyoung-min Ryu, YongChan Jung, Jinho Ahn, and In-Sung Park | 2012.08.28 | |
| 150 | Enhanced light extraction from Y2O3: Eu3+ Phosphor Films via vacuum nano-imprint lithography using spin-on dielectric (SOD) materials | The 4rd International Conference on Microelectronics and Plasma Technology (ICMAP 2012) | Kilbock Lee, Kikang Kim | 2012.07.05 | |
| 149 | Enhanced Light Extraction from Y2O3: Eu3+ Phosphor Films via Vacuum Nano-Imprint Lithography using Spin-on Dielectric (SOD) Materials | ICMAP 2012 | Kilbock Lee, Ki-Kang Kim, Ki-Young Ko, Jinho Ahn | 2012.07.05 | |
| 148 | Atomic Layer Deposited Y2O3 Film with Novel Liquid Y-Precursor and its Application to Resistive Switching Device | AVS 12th International Conference on Atomic Layer Deposition | Yong Chan Jung, Kyoung-min Ryu, In-Sung Park, Jinho Ahn, Wontae No, Venkateswara R. Pallem, Christian Dussarrat | 2012.06.19 | |
| 147 | Coherent EUV source based on high-order harmonic generation for actinic inspection tool | 2012 International Workshop EUV Lithography | 이재욱,이상설,도종걸,홍성철,이승민 | 2012.06.07 | |
| 146 | Coherent EUV Source Based on High-order Harmonic Generation for Actinic Inspection Tool | 2012 International Workshop on EUV Lithography | Jae-uk Lee, Sangsul Lee, Jonggul Doh, Seongchul Hong, Seungmin Lee, Seejun Jeong and Jinho Ahn | 2012.06.07 | |
| 145 | Optical Design of Absorber Materials for Reduced H-V CD Bias in EUV Lithography | 2012 International Workshop on EUV Lithography | Seongchul Hong, Sangsul Lee, Jae Uk Lee, Inhwan Lee, Jonggul Doh, Seung Min Lee, Seejun Jeong, and Jinho Ahn | 2012.06.06 | |
| 144 | Lithographic performance of EUV mask using coherent scattering microscopy | The 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 2012) | 도종걸,이상설,이재욱,홍성철 | 2012.05.30 | |
| 143 | Thin Attenuated PSM for Extreme Ultraviolet Lithography | International Conference on Electronic Materials and Nanotechnology for Green Environment(ENGE2011) | 이재욱,홍성철,이상설 | 2011.10.28 | |
| 142 | The Effect on CD Performance for Carbon Contamination of EUV Mask using Coherent Scattering Microscopy / In-situ Contamination System | 24th International Microprocesses and Nanotechnology Conference(MNC 2011) | Jae Uk Lee, Sung Chul Hong, Sangsul Lee, Jung gul Do and Jinho Ahn | 2011.10.26 | |
| 141 | Formation of SiO2 nanoparticle patterns on Y2O3: Eu3+ thin film phosphors using nanoimprint lithography | The 9th International Nanotech Symphsium & Exhibition in Korea(NANO KOREA 2011) | 허은진,이길복,최윤식 | 2011.08.26 | |
| 140 | FABRICATION OF 2D PHOTONIC CRYSTAL ON Y2O3: Eu3+ THIN FILM PHOSPHOR USING SPIN-ON GLASS MATERIAL | 2011 International Forum on Functional Materials(IFFM 2011) | 이길복,허은진,최윤식 | 2011.07.30 | |
| 139 | Insulator and Electrode Effects on Metal-Insulator-Metal Capacitor | 11th International Conference on Atomic Layer Deposition | Kyoung-min Ryu, In-Sung Park, Seung-jun Park, Jinho Ahn, Jaehack Jeong | 2011.06.27 | |
| 138 | Thin Half-tone Phase Shift Mask Stack for Extreme Ultraviolet Lithography | 2011 International Workshop On EUV Lithography | Inhwan Lee, Sangsul Lee,Jae Uk Lee, Chang Young Jeong, Sunyoung Koo, Changmoon Lim,and Jinho Ahn | 2011.06.16 | |
| 137 | Interface Trap Density in Pentacene Field Effect Transistor Depending on Various Channel Engineering | 22nd IC ME&D | Sangsul Lee, Seung-jun Park, In-Sung Park, Jinho Ahn | 2011.05.19 | |
| 136 | Effect of Gas Annealing on Resistance Modification of Graphene | 22nd IC ME&D | Seung-jun Park, Sangsul Lee, In-Sung Park, D. Whang, Jinho Ahn | 2011.05.19 | |
| 135 | Performance of Organic Field Effect Transistors with High-k Gate Oxide after Application of Consecutive Bias Stress | 22nd IC ME&D | Sangsul Lee, Seung-jun Park, In-Sung Park, D. Whang, Jinho Ahn | 2011.05.19 | |
| 134 | Fabrication of Y2O3:Eu3+ gel 2D PC assisted thin-film phosphors using direct nano-imprinting with various working pressure | MNC2010 | Eunjin Her1, Kiyoung Ko1, Heon Lee2, Young Rag Do3 and Jinho Ahn1 | 2010. 11. 09 | |
| 133 | Nano-size patterning with Nanoimprint Lithography Using PVA transfer layer | MNC2010 | In-sung Park and Jinho Ahn | 2010. 11. 09 | |
| 132 | Interface characteristics with in-situ water vapor treatment of Ge substrate and HfO2 dielectric growth with atomic layer decomposition | MNC2010 | Young-Jae Choi, In-Sung Park and Jinho Ahn | 2010. 11. 09 | |
| 131 | Fabrication of the CNTs network structure using poly(dimethylsiloxane) mold stamp | AsiaNANO 2010 | Haegu Yeo, Jeongeun Seo, Ko-Young Ko, Taeyoung Noh, Jinho Ahn, Haiwon Lee | 2010. 11. 01 | |
| 130 | Analysis of imaging performance on EUV mask using EUV CSM/ICS | ENGE 2010 | Chang Young Jeong, Sangsul Lee, Jong Gul Doh, Jae Uk Lee, Inhwan Lee, Dong Geun Lee2, Seong-Sue Kim2, Han-Ku Cho2, Seung-yu Rah3 and Jinho Ahn1 | 2010. 11 .21 | |
| 129 | The study on influence of carbon contamination on imaging performance of EUV mask using CSM/ICS | 2010 International symposium on Extreme Ultraviolet Lithography | Sangsul Lee, Chang Young Jeong, Jong Gul Doh, Jae Uk Lee, Inhwan Lee, Dong Geun Lee, Seong-Sue Kim, Han-Ku Cho, Seung-yu Rah, and Jinho Ahn | 2010. 10. 17 | |
| 128 | The suggestion of novel attenuated phase shift mask structure in Extreme Ultraviolet Lithography | 2010 International symposium on Extreme Ultraviolet Lithography | Chang Young Jeong, Sangsul Lee, Jong-Gul Doh, Jae Uk LEE, Inhwan Lee, Seung-yu Rah and Jinho Ahn | 2010. 10. 17 | |
| 127 | Analysis of compound on EUV mask surface and chamber circumstance using EUV CSM/ICS and RGA | 2010 International symposium on Extreme Ultraviolet Lithography | Jonggul Doh,Chang Young Jeong,Sangsul Lee,Jaewook Lee, Inhwan Lee, Dong Geun Lee,Seong-Sue Kim,Han-Ku Cho, Seung-yu Rah,Jinho Ahn | 2010. 10. 17 | |
| 126 | Optical performance of indium tin oxide absorbing mask in extreme ultraviolet lithography | IUMRS - ICEM 2010 | Hee Young Kang, Sungjin Park, Jang Hoon Lee, Chang Kwon Hwangbo, Hwan-Seok Seo, Seong0Su Kim, Han-Ku Cho, and Jinho Ahn | 2010. 08. 22 | |
| 125 | Impact of Ozone Concentration on Atomic Layer Deposited Hafnium Oxide on GaAs | IUMRS - ICEM 2010 | Keum Jee Chung,Tae Joo Park, Prasanna Sivasubramani, Jiyoung Kim, Jinho Ahn | 2010. 08. 22 | |
| 124 | Fabrication and Opical Properties of 2D Photonic Crystal Assisted Y2O3:Eu³+ Thin-Film Phosphors by Nano-Imprint Lithography | IUMRS - ICEM 2010 | Eun-Jin Her¹, Ki-Young Ko¹, Ki-Yeon Yang², Heon Lee², Jinho Ahn | 2010. 08. 22 | |
| 123 | The Study for CD Performance and Carbon Contamination of EUV Mask using CSM(Coherent Scattering Microscopy) | IUMRS - ICEM 2010 | Jonggul Doh ,Chang Young Jeong, Sangsul Lee, Jaewook Lee, Dong Geun Lee, Seong-Sue Kim, Han-Ku Cho, Seung-yu Rah, Jinho Ahn | 2010. 08. 22 | |
| 122 | Fabrication of 2D Photonic Crystal Assisted Y2O3:Eu³+ Thin-Film Phosphors by Direct Nano-Imprint Process | NANO KOREA 2010 with IEEE NANO 2010 | Eun-Jin Her, Ki-Young Ko, Ki-Yeon Yang, Heon Lee, Young Rag Do and Jinho Ahn | 2010. 08. 17 | |
| 121 | Carbon contamination analysis and its effect on EUV mask imaging performance using CSM/ICS | NANO KOREA 2010 with IEEE NANO 2010 | Chang Young Jeong, Sangsul Lee, Jong-Gul Doh, Jae Uk LEE Dong Geun Lee, Seong-Sue Kim, Han-Ku Cho, Seung-yu Rah and Jinho Ahn | 2010. 08. 17 | |
| 120 | Bias Stress Effect On Organic Field Effect Transistors With High-K Gate Oxide | IMRC | Sunwoo Lee, Junghyuck Park, Jinho Ahn | 2010. 08. 15 | |
| 119 | Anti-Reflection coating of thermochromic VO2-Based multilayer thin film for enhanced visible light transmittance | 2010 International Symposium on Crystal Growth | Seung Jun Park, Hwe kyung Kimb, Jin Ho ahn ,and Woo Seok Yang | 2010. 08. 08 | |
| 118 | Analysis of carbon contamination on EUV mask using CSM / ICS | 2010 International Workshop On EUV Lithography | Jae Uk Lee, Chang Young Jeong, Sangsul Lee, Jong Gul Doh, Dong Geun Lee, Seong-Sue Kim, Han-Ku Cho, Seung-yu Rah and Jinho Ahn | 2010. 06. 15 | |
| 117 | Effect of ozone concentration on atomic layer deposited high-k dielectric on Si and GaAs | 217th ESC Meeting | K. J. Chung1,2, T. J. Park1, P. Sivasubramani1. J. Kim and J. Ahn | 2010. 04. 25 | |
| 116 | Fabrication of Nanosphere Patterns by Using Micro-contract Transfer Printing | EIPBN | Young-Jae Choi,Ki-Young Ko, Sang-Su Park, Min-Hyik Bang, Jinho Ahn | 2010. 04. 01 | |
| 115 | The analysis of carbon Contamination of EUV mask using CSM | SPIE Adanced Lithography 2010 | Chang Young Jeong, Sangsul Lee, Hyun-Duck Shin, Jong Gul Doh, Dong-Gun Lee, Seoung Sue Kim, Han-Ku Cho, Seung-yu Rah and Jinho Ahn | 2010. 02. 27 | |
| 114 | Refilled Phase Shift Mask for Minimizing Shadowing Effect | MNC2009(2009 International Microprocesses and Nanotechnology Confeerence) | H.-D. Shin, C.Y.Jeong, S. Lee, T.G.Kim and J. Ahn | 2009. 11. 18 | |
| 113 | Controlability of Operating Parameters in Pt/HfO2/ZrO2/Pt Resistance Switching Device | 2009 International Conference on Nanoscience and Nanotechnology | Ju-Bin Seo, In-Sung Park, Young-Jae Choi and Jinho Ahn | 2009. 11. 06 | |
| 112 | Nano-Size Patterning on Various Substrates with Nanoimprint Lithograp | 2009 International Conference on Nanoscience and Nanotechnology | In-Sung Park, Ki-young Ko, and Jinho Ahn | 2009. 11. 05 | |
| 111 | Development of Mask Contamination/Inspection System by Coherent EUV Light | 2009 international Symposium Extreme ultraviolet lithograph On EUV Lithography | S. Lee, C. Jeong, S. Rah, D. Lee, S. Kim, H. Cho, J. Ahn | 2009. 10. 20 | |
| 110 | Improvement of Imaging Properties by Optimizing the Mask Structure Using Phase Shift Effect | 2009 international Symposium Extreme ultraviolet lithograph On EUV Lithography | C. Jeong, S. Lee, H. Shin, T. Kim, j. Ahn | 2009. 10. 19 | |
| 109 | Altermative oxdant effects on chemical structure and electrical properties of atomic-layer-deposited La2O3 film on Si using tris(N,N'-diisopropylformamidinato) lanthanum[La(PrfAMD)3] | ALD 2009(9th international conference on atomic layer deposition) | Tae Joo Park, Keum Jee Chung, Jinho Ahn, Hyun-chul Kim, Robert. M. Wallace, and Jiyoung Kim, Xinye Liu, Jae Hyung Yi, Mike Rousseau, D. Shenai, and J. Suydam | 2009. 07. 19 | |
| 108 | Precursor dependent rutile phase formation of atomic-layer deposited TiO2 film on Ru electrode for DRAM capacitor applications | ALD 2009(9th international conference on atomic layer deposition) | Tae Joo Park, Keum Jee Chung, Jinho Ahn, Hyun-chul Kim, Robert. M. Wallace, and Jiyoung Kim, Xinye Liu, Jae Hyung Yi, Mike Rousseau, D. Shenai, and J. Suydam, | 2009. 07. 19 | |
| 107 | Optimizing Structure of Attenuated Phase Shift Mask for Minimizing Shadowing Effect | 2009 International Workshop On EUV Lithography | Hyun-Duck Shin1, Chang Young Jeon, Sangsul Lee, Tae Geun Kim, and Jinho Ahn | 2009. 07. 15 | |
| 106 | Development of Mask Contamination/Inspection System for EUV Lithography | 2009 International Workshop On EUV Lithography | Sangsul Lee, Chang Young Jeong1, Dong Geun Lee, Seong-Sue Kim, Han-Ku Cho3, Seung-yu Rah, Ohyun Kim, Moonsuk Yi and Jinho Ahn | 2009. 07. 15 | |
| 105 | Characteristics of organic field-effect-transistor with high dielectric constant layer | AWAD2009 | S. Lee, Y. J. Choi, J. Park, K. Y. Ko, I.-S. Park and J. Ahn | 2009. 06. 24 | |
| 104 | Effect Of Electrical Characteristics By Surface Modification In Pentacene Field Effect Transistor With Thin Al2O3 Gate Oxide Layer | EIPBN | Sunwoo Lee, Youngjae Choi, Ki-Young Ko, Chang Young Jeong, In-Sung Park and Jinho Ahn | 2009. 05. 27 | |
| 103 | The Imporvemet of Imaging Properties By Optimizing The Capping Structure In Extreme Ultraviolet Lithography | EIPBN | Chang Young Jeong, Sangul Lee, Hyun-duck Shin, Tae Geun Kim, Sunwoo Lee, In-Sung Park and Jinho Ahn | 2009. 05. 27 | |
| 102 | Electrical Characteristics by various gate oside engineering in organic field errect transistor with high dielectric constant layer | ARN Symposium2009 & 2nd TEXAS-KOREA NANOTECH Workshop | Sunwoo Lee, Ju Bin Seo, Jung Hyuck Park, In-Sung Park, Jinho Ahn | 2009. 05. 18 | |
| 101 | Overview of Infrastructures for Extreme Ultra Violet Lithography | ARN Symposium & Workshop | Sansul lee, Chang Young Jeong, Hyunduck Shin, Tae Geun Kim, Seungyu Rah and Jinho Ahn | 2009. 05. 18 | |
| 100 | Oxidant Effect during HfO2 Deposition on the Electrical Characteristics of Metal-Insulator-Ge Capacitors | ARN Symposium & Workshop | Youngjae Choi, Sunwoo Lee, Ki-Young Ko, In-Sung Park and Jinho Ahn | 2009. 05. 18 | |
| 99 | Oxidant Effect during HfO2 Deposition on the Electrical and Chemical Characteristics of Metal-Insulator-Ge Capacitors | Materials Research Society(MRS) | Youngjae Choi, Sunwoo Lee, In-Sung Park, Ki-Young Ko and Jinho Ahn | 2009. 04. 15 | |
| 98 | Metal-Insulator-Metal Capacitors Using Atomic Layer Deposited Al2O3 and HfO2 Dielectrics | PRiME Meeting on Electrochemical and Solid-State Science | In-Sung Park, Seungki Yoon, Jinho Ahn, Kiman Kim, and Jaeho Choi | 2008. 10 | |
| 97 | Design of Attenuated PSM Structure for Extreme Ultraviolet Lithography | 2008 International Microprocesses and Nanotechnology Conference | Hyun-Duck Shin, Chang Young Jeong,, Sangsul Lee, Tae Geun Kim, Byung Hun Kim, Eun Jin Kim, Hye-Keun Oh, In-Sung Park, Seungyu Rah, and Jinho Ahn | 2008. 10 | |
| 96 | Characteristics of pentacene organic field effect transistors with OTS self-assembled monolayer treated HfO2 gate oxide | 2008 International Microprocesses and Nanotechnology Conference | Sunwoo Lee, Sangsul Lee, Jeong Ho Park, In-Sung Park, and Jinho Ahn | 2008. 10 | |
| 95 | The Dependence of MEEF on the Mask Shadowing effect | 2008 International Symposium on Extreme Ultraviolet Lithography | C.Jeong,S. Lee,H.Shin,T.Kim,E.Kim,H.Oh, I.Park, J.Ahn | 2008. 09 | |
| 94 | Electrical Characteristics of Orgnic Field Effect Transistor by Forming Gas Treatment of High-k Al2O3 at Low Temperature | ,SOLIDE DEVICES AND MATERIALS | Sunwoo Lee, Seungki Yoon,In-sung Park and Jinho Ahn | 2008. 09 | |
| 93 | Electrode dependent electrical properties of capacitor with Siand Ge substrate | The 7th Korea-Japan Conference on Ferroelectricity | Youngjae Choi, Keum Jee Chung, Chang Kyoung Kim, Jinho Ahn, In-Sung Park, Jack C. Lee, and Taeho Lee | 2008. 08 | |
| 92 | A Study of Attenuated PSM Structure for EUVL to Minimize Mask Shadowing Effect | international workshop on EUV lithography | Sangsul Lee, Chang Young Jeong, Tae Geun Kim, Hyun-Duck Shin, Eun Jin Kim, Hye-Keun Oh, Jinho Ahn | 2008. 06 | |
| 91 | Out-gassing study of resist for EUV lithography | Special Symposium on Emerging Science & Technology | Sangsul Lee, Chang Young Jeong, Tae Geun Kim, Hyun-Duck Shin, In-Sung Park, Seungyu Rah and Jinho Ahn | 2008. 06 | |
| 90 | A Novel Attenuated PSM Structure for Extreme Ultra Violet Lithography | Special Symposium on Emerging Science & Technology | Chang Young Jeong, Sang sul lee, Tae geun Kim, Hyun-Duck Shin, In-Sung Park, Seungyu Rah and Jin ho Ahn | 2008. 06 | |
| 89 | Characteristics of pentacene field effect transistor with high-k gate dielectric layer | Special Symposium on Emerging Science & Technology | Sunwoo Lee, Seungki Yoon, Keum-Jee Chung, In-sung Park, and Jinho Ahn | 2008. 06 | |
| 88 | Switching method effects for resistance switching characteristics of atomic layer deposited HfO2 thin film | Special Symposium on Emerging Science & Technology | Seungki Yoon, In-sung Park, Sungho Kim, Yang-kyu Choi, and Jinho Ahn | 2008. 06 | |
| 87 | Dependence of electrical and time stress in organic field effect transistor with low temperature forming gas treated Al2O3 gate dielectrics | 19th International Conference on Molecular Electronics and Devices | S. Lee, K. J. Chung, I. Park and J. Ahn | 2008. 06 | |
| 86 | The study of attenuated-PSM structure for extreme ultraviolet lithography with minmized mask shadowing effect | SPIE Adanced Lithography | Chang Young Jeong, Byung Hun Kim, Tae Geun Kim, Sangsul Lee, Eun Jin Kim, Hye-Keun H. Oh, In-Sung Park, Jinho Ahn | 2008. 02 | |
| 85 | Surface properties of EUVL mask layers after high energy laser shock cleaning | 2007 International Extreme Ultraviolet Lithography(EUVL) Symposium | Tae-Gon Kim, Young-Sam Yoo, Il-Ryoung Son, Tae-Geun Kim, Jinho Ahn, Jong-Myoung Lee, Jae-Sung Choi, Ahmed A. Busnaina, Jin-Goo Park | 2007. 10 | |
| 84 | Outgassing study of resist for extreme ultraviolet lithography at PAL | 2007 International Extreme Ultraviolet Lithography (EUVL) Symposium | SangSul Lee, Chung Yong Kim, Tae Geun Kim, Chang Young Jeong, Seungyu Rah, Jun Lim, Jinho Ahn | 2007. 10 | |
| 83 | Optical and physical characteristics of EUV phase shift masks | 2007 International Extreme Ultraviolet Lithography(EUVL) Symposium | Tae Geun Kim, Byung Hun Kim, Chang Young Jeong, Chung Yong Kim, Sangsul Lee, Eun Jin Kim, Hye-Keun Oh, In-Sung Park, Doo Young Kim, Nae-Eung Lee, Jinho Ahn | 2007. 10 | |
| 82 | Oxidant effect on resistance switching characteristics of HfO2 film grown atomic layer deposition | 212th Meeting of The Electrochemical Society | Jooho Lee, In-Sung Park, Keum Jee Jung, Sunwoo Lee, Jungho Park, and Jinho Ahn | 2007. 10 | |
| 81 | Resistance switching of HfO2 film and its application to non-volatile memory | 2007 Solid State Devices and Materials | Jooho Lee, In-Sung Park, Jungho Park, Keum Jee Jung, Sunwoo Lee and Jinho Ahn | 2007. 09 | |
| 80 | HfO2/PVP gate dielectirc stack structure for pentacene FETs | 2007 MRS Spring Meeting | Sang Seol Lee, In Sung Park, Young Gug Seol, Nae Eung Lee and Jinho Ahn | 2007. 04 | |
| 79 | Resistance Switching Characteristics of HfO2 Film for Resistance Change Random Access Memory | International Conference on Nanoscience and Nanotechnology | In-Sung Park, Jooho Lee, and Jinho Ahn | 2006. 12 | |
| 78 | Resistive switching characteristics of Binary Metal Oxides | Solid State Devices Materials | In-Sung Park, Kyong-Rae Kim, Jinho Ahn | 2006. 09 | |
| 77 | Theoretical Investigation of Pattern Printability of Oxidized Si and Ru Capping Model for Extreme Ultraviolet Lithography(EUVL) | Proceedings of the 32nd International Conference on Micro- and Nano-Engineering | In-Yong Kang, Jinho Ahn, Chung Yong Kim, Hye-Kuen Oh, and Yong-Chae Chung | 2006. 09 | |
| 76 | Nanoscale patterning using photo-assisted polymer transfer lithography | Micro-and Nano-Engineering(MNE) 2006 | In-Sung Park, Moonik Jang, and Jinho Ahn | 2006. 09 | |
| 75 | Application of oxidation resistive Ru capping layer for EUVL mask | IUMRS - ICA - 2006 | Chung Yong Kim, Tae Guen Kim, Byung Hun Kim, Seung Yoon Lee, Jinho Ahn | 2006. 09 | |
| 74 | Degradation of Trichlorosilane based SAM antistiction layer | IUMRS - ICA - 2006 | Kyeongjae Byeon, Seunghyun Ra, Jinho Ahn, Heon Lee | 2006. 09 | |
| 73 | Substrate dependent Formation of Self-assembled Monolayer | IUMRS - ICA - 2006 | BangLim Choi, Joo-Ho Lee, In-Sung Park, Jinho Ahn | 2006. 09 | |
| 72 | Organic Thin Film Transistors with a HfO2/PVP Laminate Gate Dielectric Layer | IUMRS - ICA - 2006 | Sang Seol Lee, Sunwoo Lee, YoungGug Seol, InSung Park, NaeEung Lee, Jinho Ahn | 2006. 09 | |
| 71 | Embossing lithography on sticky thermoset polymer using Ni template | IUMRS - ICA - 2006 | Kyeongjae Byeon, Sunghoon Hong, Kiyeon Yang, Seunghyun Ra, Jinho Ahn, Heon Lee | 2006. 09 | |
| 70 | Resistive switching characteristics of HfO2 film grown by atomic layer deposition technique | AVS 6th International Conference on Atomic Layer Deposition | Kyong-Rae Kim, In-Sung Park, Sang-Seol Lee, BangLim Choi, Sunwoo Lee, Jinho Ahn | 2006. 07 | |
| 69 | Development of the EUVL test bed in PAL | SRI2006 | S. Y. Lee, T. G. Kim, C. Y. Kim, B.-H. Kim, J. Ahn, S. Rah O. Kim M. Yi | 2006. 05 | |
| 68 | Novel absorber stack for minimizing shadow effect in EUV mask fabrication | The 50th international conference on electron, ion and Photon beam technology and nanofabrication(EIPBN) | Tae Geun Kim, Seung Yoon Lee, Chung Yong Kim, Byung Hun Kim, In-Yong Kang, Nae-Eung Lee, Chung Yong Kim, Jinho Ahn | 2006. 05 | |
| 67 | Theoretical Prediction of Optical Performance of Ru and Si Capped Reflectors for Extreme Ulrtaviolet Lithography(EUVL) | The 50th international conference on electron, ion and Photon beam technology and nanofabrication(EIPBN) | In-Yong Kang, Yong-Chae Chung, Chung Yong Kim, Jinho Ahn, Hye-Keun Oh, Takeo Watanabe, Hiroo Kinoshita | 2006. 04 | |
| 66 | Application of HfO2-based inorganic Dielectric material for organic field effect transistor | 2006 MRS | Sunwoo Lee, Sang Seol Lee, Taeho Lee, In-Sung Park, and Jinho Ahn | 2006. 04 | |
| 65 | Numerical Modeling of Absorber Characteristics for EUVL | SPIE(the international society for optical engineering) | In-Yong Kang, Jinho Ahn, Hye-Keun Oh, Yong-Chae Chung | 2006. 02 | |
| 64 | Combined absorber stack for optimization of the EUVL mask | SPIE(the international society for optical engineering) | T. Kim, S. Y. Lee, W. S. Kim, C. Kim, I .Kang, Y. Chung, J. Ahn | 2006. 02 | |
| 63 | Optimization of Absorber stack of EUVL mask in optical and etch properties | 4th International Extreme Ultraviolet Lithography Symposium | SeungYoon Lee, WooSam Kim, TaeGeun Kim, In-Yong Kang, Yong-Chae Chung, and Jinho Ahn | 2005. 11 | |
| 62 | Microstructure effect on forming and resistance switching of TiO2 fabricated by multi-step deposition | 2005 Korea-China Workshop on Advanced Materials | Jinho Ahn, In-Sung Park, Taeho Lee | 2005. 10 | |
| 61 | Oxidant Effect on Characteristics of Thin HfO2 Film Grown by Atomic Layer Deposition | 2005 The Electrochemical Society 208th ECS meeting | I.-S. Park, H. Ko, T. Lee, K. Kim, and J. Ahn | 2005. 10 | |
| 60 | Characterization of ALD-HfO2 using H2O and D2O as an oxidant | Digest of The International Microprocesses and Nanotechnology Conference 2005 | Jinho Ahn, Taeho Lee, In-Sung Park, Han-Kyoung Ko | 2005. 10 | |
| 59 | Effect of oxidant on properties of ultra thin HfO2 films grown by atomic layer deposition | AVS 5th International Conference on Atomic Layer Deposition | Hankyoung Ko, Taeho Lee, Sangsul Lee, In-Sung Park, KyongRae Kim, and Jinho Ahn | 2005. 08 | |
| 58 | Novel hybrid mask mold for combined nanoimprint and photolithography technique | Micro and Nano Coference (MNE) 2005 | K. Moon, B. Choi, I. Park, S. Hong, K., H. Lee, and J. Ahn | 2005. 08 | |
| 57 | Characterization of Ru layer for capping/buffer application | Micro and Nano Coference (MNE) 2005 | Tae Geun Kim, Seung Yoon Lee, Chung Yong Kim, In-Sung Park, In-Yong Kang, Nae-Eung Lee, Yong-Chae Chung, and Jinho Ahn | 2005. 08 | |
| 56 | Silicide formation by e-beam local heating for phase defect correction of EUV reflective multilayer | 49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN) | Seungyoon Lee, Taegeun Kim, Woosam Kim and Jinho Ahn | 2005. 05 | |
| 55 | Reliability characteristics of HfO2 Gate Dielectrics Prepared by Atomic Layer Deposition Using HfCl4 and TEMAH | 2005 MRS Spring Meeting, San francisco | Taeho Lee, Hankyong Ko, In-Sung Park, Jinho Ahn and Jaehak Jung | 2005. 03 | |
| 54 | Characteristics of Mo/Ru/Si Multilayer Reflector Structure | 3rd International EUVL Symposium | T. G. Kim, W.S.Kim, I.-Y. Kang, Y.-C. Chung, S-Y Lee and J. Ahn | 2004. 11 | |
| 53 | Characteristics of Mo/Ru/Si Multilayer Reflector Structure | Microprocesses and Nanotechnology 2004 | T. G. Kim, W. S. Kim, I.-Y.Kang, Y.-C.Chung and J.Ahn | 2004. 10 | |
| 52 | Numerical Investigation of Defect Printability in Extreme Ultraviolet (EUV) Reflector:Ru/Mo/Si Multilayer system | Microprocesses and Nanotechnology 2004 | I.-Y.Kang, J.Ahn, H.-K. Oh and Y.-C.Chung | 2004. 10 | |
| 51 | Control of dispersion characteristics of TiO2 nano-powders for electronic paper | Proceedings of the International Conference on the Characterization and Control of Interfaces for High Quality Advanced Materials (ICCCI) | S. H. Kwon, J. Ahn, Y. I. Cho, W. S. Hong and S. J. Kim | 2004. 09 | |
| 50 | Characterization of Low Temperature Radical Oxidation to Tunnel Oxide in Flash Memory | 일본 응용물리학회 학술강연회 | C. S. Kim, J. H. Heo, Y. J. Noh, B. Y. Koo, Y. P. Kim, G. H. Buh, J. H. Ahn, Y. G. Shin, U-In Chung, and J. T. Moon | 2004. 09 | |
| 49 | Improvement of EUV Multilayer Reflector Structure | NANO KOREA 2004 | T. G. Kim, W. S. Kim, I. Y. Kang, Y. C. Chung and J. Ahn | 2004. 08 | |
| 48 | Properties of ultra-thin hafnium oxide and interfacial layer deposited by atomic layer deposition | The 8th China-Korea Workshop on Advanced Materials | Ahn Jinho | 2004. 08 | |
| 47 | Key technology development for EUVL mask fabrication | 2004 Asia-pacific workshop on fundamentals and application of advanced semiconductor devices | J. Ahn, T. Kim and S. Lee | 2004. 07 | |
| 46 | Investigation on phase defects correction by the localized e-beam heating | The 7th International Conference on the Physics of X-Ray Multilayer Structure | Seung Yoon Lee, Tae Geun Kim, Takeo Watanabe, Hamamoto, Hiroo Kinoshita, Jinho Ahn | 2004. 03 | |
| 45 | Structural characterization of Mo/Ru/Si EUV reflector by optical modeling | Digest of The International Microprocesses and Nanotechnology Conference | In-Yong Kang, Tae Geun Kim, Seung Yoon Lee, Jinho Ahn1 and Yong-Chae Chung | 2003. 10 | |
| 44 | Verification fo phase defect correctability of EUV reflective multilayer | Digest of The International Microprocesses and Nanotechnology Conference | S. Lee, T. Kim, J. An, B. Han, J. Park, J. Kim, C. Lee and J. Ahn | 2003. 10 | |
| 43 | Evaluation of property change by the insertion of Ru layer into Mo/Si multilayer | 2nd International Extreme Ultraviolet Symposium | J. Ahn, Y. CHung, S. Lee, and T. Kim | 2003. 09 | |
| 42 | Enhancement of EUV reflective multilayer properties by the insertion of Ru barrier layer | Digest of The International Microprocesses and Nanotechnology Conference | S. Lee, T. Kim, H. Kim, J. Ahn | 2002. 11 | |
| 41 | A study on the simulation and characterization of the barrier layers for EUV reflective multilayers for EUV lithography applications | The 3rd Japan-Korea Joint Workshop on Advanced Semiconductor Processes and Equipments, Hakone | S. Lee, H. Kim, I. Kang, Y. Chung, J. Ahn | 2002. 10 | |
| 40 | Characterization of atomic layer deposited HfO2/SiON stack gate dielectrics | AVS Topical Conference on Atomic Layer Deposition | Y. Kim, T. Lee, M. Kang, J. Ahn, D. Choi, K. Hyun | 2002. 08 | |
| 39 | Properties of HfO2 gate dielectrics prepared by atomic layer deposition using HfCl4/H2O precursors | AVS Topical Conference on Atomic Layer Deposition | T. Lee, Y. Kim, J. Oh, Y. Kim, D. Choi, K. Hyun, J. Ahn | 2002. 08 | |
| 38 | Characterization and electrical properties of ultra thin HfO2 gate dielectrics prepared by atomic layer deposition. | Materials Research Society 2002 Spring Meeting | T. Lee, J. Oh, Y. Kim, D. Choi, J. Jung, J. Ahn | 2002. 04 | |
| 37 | Characterization of ultra thin HfO2 gate dielectrics prepared by atomic layer deposition | The 3rd International Symposium on Electronic Materials and Packaging | T. Lee, J. Oh, J. Ahn, Y. Kim, D. Choi, J. Jung | 2001. 11 | |
| 36 | Analysis of multilayer structure for reflection of extreme ultra-violet wavelength | Digest of The International Microprocesses and Nanotechnology Conference / S. Lee, S. Hur, H. Kim, D. Lee, Y. Lee, I Kang, Y. Chung, M. Yi, C. Bok, and J. Ahn | 2001 | ||
| 35 | Comparison of Pt etching characteristics with SF6 and Cl2 plasma chemistries | Digest of The International Microprocesses and Nanotechnology Conference / S. Kim, S. Ju and J. Ahn | 2001 | ||
| 34 | Study on surface roughness of Pt electrode Etching with Cl2/Ar and SF6/Ar plasma chemistries | EIPBN / Sang Hoon Kim, Sup-Youl Ju and Jinho Ahn | 2001 | ||
| 33 | Characterization of Ultra HfO2 Gate Dielectric Prepared by Atomic Layer Deposition | The 3rd International Symposium on Electronic Materials and Packaging / Taeho LEE, Jaemin OH, jinho AHN, Youngbae KIM, Duckkyun CHOI, Jaehak JUNG | 2001 | ||
| 32 | Actinometry study for etching characteristics of Ta film using chlorine plasma | Proceedings of XEL Symposium | 2000 | ||
| 31 | Deposition and Characterization of Ta, TaNx, and Ta4B Films for NGL Mask Application | Digest of The International Microprocesses and Nanotechnology Conference / S. Lee and J. Ahn | 2000 | ||
| 30 | Effects of SF6 addition to O2 plasma on Polyimide etching in ECR plasma etcher | Digest of The International Microprocesses and Nanotechnology Conference / Sang Hoon Kim, Hosung Moon and Jinho Ahn | 2000 | ||
| 29 | Etching Characteristics of Fine Ta Patterns with Electron Cyclotron Resonance Chlorine Plasma | Digest of The International Microprocesses and Nanotechnology Conference / Sang Hoon Kim, Sang-gyun Woo, Jinho Ahn | 2000 | ||
| 28 | A Study on the Properties of Interlayer Low Dielectric Polyimide during Cl-based Plasma Etching of Aluminum | Digest of The International Microprocesses and Nanotechnology Conference / Sang Hoon Kim, Ho sung Moon, Sang gyun Woo, Jinho Ahn | 1999 | ||
| 27 | A study on the W-Ti absorber property with various Ti composition for x-ray lithography mask | Digest of 1998 ISPSA / J. Ko, J. Ahn | 1998 | ||
| 26 | Deposition of low stress, high transmittance SiC as an X-ray mask membrane using ECR plasma CVD | Abstract of 1998 MRS Spring Meeting / S. Lee, K. Sonh, J. Ahn | 1998 | ||
| 25 | A research on the anisotropic etching of tungsten-nitride for x-ray mask | Digest of The International Microprocesses and Nanotechnology Conference / H. Lee, C. Jeong, S. Lee, J. Ahn, K. Song, C. Park, Y. Jeon, D. Lee | 1998 | ||
| 24 | High-transmittance SiC membrane prepared by ECR plasma CVD in combination with Rapid Thermal Annealing | Digest of The International Microprocesses and Nanotechnology Conference / K. Song, D. Lee, Y. Jeon, C. Park, H. Noh, S. Yoon, T. Lee, J. Kang, and J. Ahn | 1998 | ||
| 23 | Stress and microstructure of WNx bilayer films for x-ray masks | Digest of The International Microprocesses and Nanotechnology Conference / D. Lee, C. Park, K. Song, Y. Jeon, T. Lee, C. Jeong and J. Ahn | 1997 | ||
| 22 | Low stress WNx bilayer absorber films for x-ray masks | Digest of XEL / D. Lee, C. Park, K. Song, Y. Jeon, T. Lee, C. Jeong and J. Ahn | 1997 | ||
| 21 | Current status of mask development for x-ray lithography at PALC | Digest of C-MRS & MRS-K Joint Symposium / J. Ahn | 1996 | ||
| 20 | ICP etching of tungsten for x-ray masks | Digest of 2nd Korea-Japan Symposium on Plasma and Thin Film Technology / C. Jeong, K. Song, C. Park, Y. Jeon, D. Lee, and J. Ahn | 1996 | ||
| 19 | N- and P-MOSFETs with CVD and thermal gate oxides: Comparison of performance and reliability | Proceedings of the Third IUMRS-ICA- / J. Ahn and D. L. Kwong | 1995 | ||
| 18 | Radiation-hard SiNx film by UHV ECR Plasma CVD for x-ray lithography mask membrane applications | Digest of PRICM-2 / J. Ahn, K. Suzuki, S. Tsuboi, and Y. Yamashita | 1995 | ||
| 17 | Consideration of chemical bond configurations for radiation-hard UHV ECR-CVD SiNx x-ray mask membrane | Digest of Photomask Japan / J. Ahn, K. Suzuki, S. Tsuboi, and Y. Yamashita | 1995 | ||
| 16 | UHV ECR-CVD SiNx films for x-ray lithography mask membrane: As-deposited properties and radiation stability | Digest of The 7th International MicroProcess Conference / Jinho Ahn, Katsumi Suzuki, Shinji Tsuboi, and Yoshiyo Yamashita | 1994 | ||
| 15 | Highly reliable oxynitride gate dielectrics for dual gate CMOS application | Extended Abstracts of 1993 Solid State Device and Materials / A. B. Joshi, J. Ahn, G. W. Yoon, J. Kim, M. Bhat, and D. L. Kwong | 1993 | ||
| 14 | Correlation between chemical structure and electrical properties of NH3-nitrided N2O oxides | Extended Abstracts of 1993 Solid State Device and Materials / M. Bhat, G. W. Yoon, A. B. Joshi, J. Kim, J. Ahn, D. L. Kwong, M. Arendt, and J. M. White | 1993 | ||
| 13 | Hot carrier related phenomenon in MOSFETs with furnace N2O-nitrided SiO2 gate oxides | Extended Abstracts of 1993 Solid State Device and Materials / J. Ahn, G. Q. Lo, and D. L. Kwong | 1993 | ||
| 12 | Properties of SiNx films for x-ray lithography mask membrane applications prepared by using a UHV ECR-CVD systems | Extended Abstract of 40th Spring Meeting of The Japan Society of Applied Physics and Related Societies / J. Ahn, and K. Suzuki | 1993 | ||
| 11 | Electrical Properties of MOSFETs with N2O-Nitrided LPCVD SiO2 Gate Dielectrics | Extended Abstracts of 1992 Solid State Device and Materials / J. Ahn, G. Q. Lo, and D. L. Kwong | 1992 | ||
| 10 | Angle Resolved X-ray Photoelectron Spectroscopy Study of Ultrathin N2O Oxides | Extended Abstracts of 1992 Solid State Device and Materials / J. Ahn, M. Arendt, J. M. White, and D. L. Kwong | 1992 | ||
| 9 | Chemically-modified ultrathin oxides fabricated by rapid thermal processing | Proceedings of SPIE 1991 Rapid Thermal and Integrated Processing / A. B. Joshi, G. Q. Lo, J. Ahn, W. Ting, and D. L. Kwong | 1991 | ||
| 8 | Thickness dependence of charge-trapping and interface state generation in ultrathin therm al oxides | Extended Abstract of Electrochemical Society Meeting / G. Q. Lo, J. H. Ahn, W. Ting, T. Chu, and D. L. Kwong | 1991 | ||
| 7 | Improved performance and reliability of MOSFETs with ultrathin gate oxides prepared by conventional furnace oxidation of Si in pure N2O ambient | Symposium on VLSI Technology / G. Q. Lo, W. Ting, J. Ahn, and D. L. Kwong | 1991 | ||
| 6 | Electrical characteristics of ultrathin stacked nitride/oxide gate dielectrics prepared by rapid thermal processing | Proceedings of Materials Research Society Meeting / W. Ting, J. Ahn, and D. L. Kwong | 1991 | ||
| 5 | Comparison of dielectric wear-out between oxides grown in O2 and N2O | 29th International Reliability Physics Symposium Extended Abstract / Wenchi Ting, G. Q. Lo, Jinho Ahn, Thomas Y. Chu, and Dim-Lee Kwong | 1991 | ||
| 4 | Electrical properties of ultrathin MOS gate dielectrics fabricated by furnace oxidation of Si in N2O | 33rd Electronic Materials Conference / J. Ahn, W. Ting, T. Chu, and D. L. Kwong | 1991 | ||
| 3 | Improved device performance and reliability of n-channel and p-channel MOSFETs with ultrathin gate oxides prepared by conventional furnace oxidation of Si in pure N2O ambient | IEEE 49th Device Research Conference Digest / G. Q. Lo, W. Ting, J. Ahn, and D. L. Kwong | 1991 | ||
| 2 | Comparisonq of performance and reliability between MOSFETs with LPCVD gate oxide and thermal gate oxide | IEEE 49th Device Research Conference Digest / J. Ahn, W. Ting, and D. L. Kwong | 1991 | ||
| 1 | Metal silicide EUV pellicle and the Effect of Wrinkles on Mask-3D Effects |
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